Detection device

ABSTRACT

A detection device includes a first substrate including a first region, a second region and a third region, the second region arranged between the first region and the third region; a detection electrode arranged on the first substrate; a first electrode coupled to the detection electrode, continuously formed from the first region to the third region in a first direction on the first substrate, and including a plurality of concave portions in the second region; and a protective layer formed on the first electrode in the first region, wherein the protective layer is formed on a first one of the concave portions in the second region, wherein the protective film is not formed on a second one of the concave portions in the second region, the second one of the concave portions is arranged nearer to the third region than the first one of the concave portions.

CROSS REFERENCES TO RELATED APPLICATIONS

The present application is a continuation of U.S. patent applicationSer. No. 14/686,155, filed on Apr. 14, 2015, which application claimspriority to Japanese Priority Patent Application JP 2014-083824 filed inthe Japan Patent Office on Apr. 15, 2014, the entire content of which ishereby incorporated by reference.

BACKGROUND

The present invention relates to an electrode substrate, a displaydevice, an input device, and a method of manufacturing an electrodesubstrate.

In recent years, a technique of attaching an input device referred to asa touch panel or a touch sensor to a display surface side of a displaydevice and detecting and outputting an input position when inputoperations are performed by contacting the touch panel with a finger oran input tool such as a touch pen has been known. Such display deviceshaving a touch panel are widely used in portable information terminalssuch as mobile phones in addition to computers.

One detecting method for detecting contact positions at which a fingeror the like has contacted the touch panel is the electrostaticcapacitance method. In an electrostatic capacitive touch panel, aplurality of capacitive elements each made up of a pair of electrodesdisposed to be opposed to each other with a dielectric layer interposedtherebetween, that is, a driving electrode and a sensing electrode areprovided in a plane of the touch panel. Then, the input positions aredetected by utilizing the characteristics that the electrostaticcapacitance of capacitive elements changes when performing inputoperations by contacting the capacitive elements with a finger or aninput tool such as a touch pen.

In the display device to which an input device such as a touch panel isattached, it is desirable to reduce electric resistance of the sensingelectrodes for improving the detection performance, and thus aconductive film such as a metal film is sometimes used as a material ofthe sensing electrode. Thus, in an electrode substrate included in thedisplay device and formed of a base and the sensing electrode formed onthe base, a protective film is formed so as to cover the sensingelectrode for preventing corrosion of the sensing electrode. At thistime, for example, a protective film is formed by applying coatingliquid by the use of an ink jet method so as to cover the sensingelectrode formed on the substrate and then curing a coating film formedof the applied coating liquid.

As the method of applying the coating liquid by the use of the ink jetmethod, for example, Japanese Patent Application Laid-Open PublicationNo. 8-227012 (Patent Document 1) and Japanese Patent ApplicationLaid-Open Publication No. 9-203803 (Patent Document 2) each describe amethod of forming a color filter of a liquid crystal display device byan ink jet method. In addition, Japanese Patent Application Laid-OpenPublication No. 2008-183489 (Patent Document 3) describes a method offorming a desired pattern by forming a lyophilic region and a repellantregion on a surface of a substrate and then discharging liquid drops tothe surface of the substrate by the use of an ink jet method. Further,Japanese Patent Application Laid-Open Publication No. 2011-145535(Patent Document 4) describes a method of forming an alignment film of aliquid crystal display device by an ink jet method.

SUMMARY

However, when the coating liquid is applied on the substrate by usingthe ink jet method, it is difficult to highly accurately adjust theposition of an end portion of the coating liquid spread over thesubstrate. Consequently, it is difficult to highly accurately adjust theposition of the end portion of the protective film formed by curing theapplied coating liquid. Therefore, there is a possibility offluctuations of the area of a portion of a sensing electrode exposedfrom the protective film among a plurality of sensing electrodes.

The above-described portion of the sensing electrode exposed from theprotective film is electrically connected to a wiring substrate.Therefore, with fluctuations of the area of the portion of the sensingelectrode exposed from the protective film, a connection resistancebetween the sensing electrode and the wiring substrate fluctuates amonga plurality of sensing electrodes, thereby possibly decreasing theperformance as an electrode substrate.

The present invention has been made to solve the problem in existingtechniques described above, and an object of the present invention is toprovide an electrode substrate capable of highly accurately adjustingthe position of an end portion of a protective film when forming theprotective film so as to cover electrodes in an electrode substrate.

The typical ones of the inventions disclosed in the present applicationwill be briefly described as follows.

An electrode substrate in an aspect of the present invention includes afirst substrate, and a first electrode continuously formed on the firstsubstrate from a first region on a first main surface of the firstsubstrate via a second region on the first main surface of the firstsubstrate over a third region on the first main surface of the firstsubstrate. Also, the electrode substrate includes a concave/convexpattern formed on the first electrode or the first substrate in thesecond region, and a protective film formed in the first region and thesecond region so as to cover the first electrode. An end portion of theprotective film on a third region side is positioned on theconcave/convex pattern.

Also, an electrode substrate manufacturing method in another aspect ofthe present invention includes the steps of (a) preparing a firstsubstrate and (b) continuously forming a first electrode on the firstsubstrate from a first region of a first main surface of the firstsubstrate via a second region of the first main surface of the firstsubstrate over a third region of the first main surface of the firstsubstrate. The electrode substrate manufacturing method includes (c)forming a concave/convex pattern on the first electrode or the firstsubstrate in the second region, and (d) after the step (c), forming aprotective film in the first region and the second region so as to coverthe first electrode. An end portion of the protective film formed in thestep (d) on a third region side is positioned on the concave/convexpattern.

Additional features and advantages are described herein, and will beapparent from the following Detailed Description and the figures.

BRIEF DESCRIPTION OF THE FIGURES

FIG. 1 is a block diagram illustrating a configuration example of adisplay device according to the first embodiment;

FIG. 2 is an explanatory diagram illustrating a state in which no fingercontacts or approaches a touch sensing device;

FIG. 3 is an explanatory diagram illustrating an example of anequivalent circuit in a state in which no finger contacts or approachesa touch sensing device;

FIG. 4 is an explanatory diagram illustrating a state in which a fingerhas contacted or approached the touch sensing device;

FIG. 5 is an explanatory diagram illustrating an example of anequivalent circuit in a state in which a finger has contacted orapproached the touch sensing device;

FIG. 6 is a diagram illustrating one example of waveforms of a drivingsignal and a sensing signal;

FIG. 7 is a plan view illustrating one example of a module having thedisplay device according to the first embodiment mounted therein;

FIG. 8 is a plan view illustrating one example of a module having thedisplay device according to the first embodiment mounted therein;

FIG. 9 is a cross-sectional view illustrating a display device with atouch sensing function in the display device according to the firstembodiment;

FIG. 10 is a circuit diagram illustrating a display device with a touchsensing function in the display device according to the firstembodiment;

FIG. 11 is a perspective view illustrating one configuration example ofdriving electrodes and sensing electrodes of the display deviceaccording to the first embodiment;

FIG. 12 is a plan view illustrating an electrode substrate according tothe first embodiment;

FIG. 13 is a cross-sectional view illustrating the electrode substrateaccording to the first embodiment;

FIG. 14 is a cross-sectional view illustrating the electrode substrateaccording to the first embodiment;

FIG. 15 is a perspective view illustrating the electrode substrateaccording to the first embodiment;

FIG. 16 is a plan view illustrating concave/convex patterns of theelectrode substrate according to the first embodiment;

FIG. 17 is a cross-sectional view illustrating another example of theconcave/convex patterns of the electrode substrate according to thefirst embodiment;

FIG. 18 is a cross-sectional view illustrating another example of theconcave/convex patterns of the electrode substrate according to thefirst embodiment;

FIG. 19 is a cross-sectional view illustrating a first modificationexample of the concave/convex patterns of the electrode substrateaccording to the first embodiment;

FIG. 20 is a cross-sectional view illustrating a second modificationexample of the concave/convex patterns of the electrode substrateaccording to the first embodiment;

FIG. 21 is a cross-sectional view illustrating a third modificationexample of the concave/convex patterns of the electrode substrateaccording to the first embodiment;

FIG. 22 is a cross-sectional view illustrating a fourth modificationexample of the concave/convex patterns of the electrode substrateaccording to the first embodiment;

FIG. 23 is a cross-sectional view illustrating a fifth modificationexample of the concave/convex patterns of the electrode substrateaccording to the first embodiment;

FIG. 24 is a cross-sectional view illustrating a sixth modificationexample of the concave/convex patterns of the electrode substrateaccording to the first embodiment;

FIG. 25 is a cross-sectional view illustrating a seventh modificationexample of the concave/convex patterns of the electrode substrateaccording to the first embodiment;

FIG. 26 is a cross-sectional view illustrating an eighth modificationexample of the concave/convex patterns of the electrode substrateaccording to the first embodiment;

FIG. 27 is a cross-sectional view illustrating a ninth modificationexample of the concave/convex patterns of the electrode substrateaccording to the first embodiment;

FIG. 28 is a cross-sectional view illustrating the electrode substrateaccording to the first embodiment during the manufacturing processthereof;

FIG. 29 is a cross-sectional view illustrating the electrode substrateaccording to the first embodiment during the manufacturing processthereof;

FIG. 30 is a perspective view illustrating the electrode substrateaccording to the first embodiment during the manufacturing processthereof;

FIG. 31 is a cross-sectional view illustrating the electrode substrateaccording to the first embodiment during the manufacturing processthereof;

FIG. 32 is a cross-sectional view illustrating the electrode substrateaccording to the first embodiment during the manufacturing processthereof;

FIG. 33 is a plan view illustrating an electrode substrate according toa comparative example;

FIG. 34 is a perspective view illustrating the electrode substrateaccording to the comparative example;

FIG. 35 is a cross-sectional view schematically illustrating a shape ofthe applied liquid on the glass substrate;

FIG. 36 is a cross-sectional view schematically illustrating a shape ofthe applied liquid in periphery of the sensing electrode formed on theglass substrate;

FIG. 37 is a cross-sectional view illustrating a display device with atouch sensing function in a display device according to a secondembodiment;

FIG. 38 is a cross-sectional view illustrating an input device as afirst modification example of the second embodiment;

FIG. 39 is an explanatory diagram illustrating an electrical connectionstate of a self-capacitance-type sensing electrode;

FIG. 40 is an explanatory diagram illustrating an electrical connectionstate of a self-capacitance-type sensing electrode;

FIG. 41 is a perspective view illustrating an external appearance of atelevision apparatus as one example of an electronic device according toa third embodiment;

FIG. 42 is a perspective view illustrating an external appearance of adigital camera as one example of an electronic device according to thethird embodiment;

FIG. 43 is a perspective view illustrating an external appearance of anotebook PC as one example of an electronic device according to thethird embodiment;

FIG. 44 is a perspective view illustrating an external appearance of avideo camera as one example of an electronic device according to thethird embodiment;

FIG. 45 is a front view illustrating an external appearance of a mobilephone as one example of an electronic device according to the thirdembodiment;

FIG. 46 is a front view illustrating an external appearance of a mobilephone as one example of an electronic device according to the thirdembodiment; and

FIG. 47 is a front view illustrating an external appearance of asmartphone as one example of an electronic device according to the thirdembodiment.

DETAILED DESCRIPTION

Hereinafter, embodiments of the present invention will be described withreference the accompanied drawings.

Note that the disclosure is merely an example and suitable changes whichmay be easily derived by a person skilled in the art while the gist ofinvention is maintained are included in the scope of the presentinvention as a matter of course. In addition, while the width,thickness, shape, etc. of respective parts may be schematicallyillustrated in the drawings as compared with the embodiments for clarityin the description, they are merely examples and do not limit theinterpretation of the present invention.

In the specification and the drawings, the same components as thosehaving been already mentioned in already-mentioned drawings are denotedby the same reference symbols and detailed descriptions thereof may beappropriately omitted.

In addition, in some drawings used in the embodiments, hatching isomitted so as to make a difference among the structures.

Moreover, in the embodiments described below, when a range is shown as Ato B, that range means A or more and B or less unless specificallymentioned.

First Embodiment

First, an example in which a display device provided with a touch panelas an input device is applied to an in-cell liquid crystal displaydevice with a touch sensing function will be described as the firstembodiment. Note that the input device is at least an input device fordetecting electrostatic capacitance which changes in accordance with acapacitance of a substance approaching or contacting the electrode inthe specification of the present application. Here, modes for detectingthe electrostatic capacitance includes not only a mutual capacitancetype for detecting the electrostatic capacitance between two electrodesbut also a self capacitance type for detecting the capacitance of oneelectrode. Also, the liquid crystal display device with the touchsensing function is a liquid crystal display device having a sensingelectrode for touch sensing provided on either a first substrate or asecond substrate on which a display unit is formed. Further, the firstembodiment describes the in-cell liquid crystal display device with thetouch sensing function having such feature that a common electrode isprovided so as to be functioned as a driving electrode of the displayunit and so as to be operated as a driving electrode of the inputdevice.

<Overall Configuration>

First, the overall configuration of the display device according to thepresent first embodiment will be described with reference to FIG. 1.FIG. 1 is a block diagram illustrating one configuration example of adisplay device according to the first embodiment.

A display device 1 includes a display device 10 with a touch sensingfunction, a control unit 11, a gate driver 12, a source driver 13, adriving electrode driver 14, and a touch sensing unit 40.

The display device 10 with a touch sensing function includes a liquidcrystal display device 20 and a touch sensing device 30. In the presentexample, the liquid crystal display device 20 is a display device usingliquid crystal display elements as display elements. The touch sensingdevice 30 is a touch sensing device of electrostatic capacitance type,that is, an electrostatic capacitive touch sensing device. Therefore,the display device 1 is a display device including an input device witha touch sensing function. Further, the display device 10 with a touchsensing function is a display device in which the liquid crystal displaydevice 20 and the touch sensing device 30 are integrated, and is adisplay device incorporating a touch sensing function, namely, anin-cell display device with a touch sensing function.

Further, the display device 10 with a touch sensing function may be adisplay device in which the touch sensing device 30 is attached on theliquid crystal display device 20. Further, as the liquid crystal displaydevice 20, it is also possible to use such as an organic EL(Electroluminescence) display device instead of the display device usingthe liquid crystal display element.

The liquid crystal display device 20 performs display by sequentiallyscanning each horizontal line in the display region in accordance withscanning signals Vscan supplied from the gate driver 12. The touchsensing device 30 operates in accordance with a principle ofelectrostatic capacitive touch sensing and outputs sensing signals Vdetas will be described later.

The control unit 11 is a circuit which respectively supplies controlsignals to the gate driver 12, the source driver 13, the drivingelectrode driver 14 and the touch sensing unit 40 based on video signalsVdisp supplied from outside for controlling them so that they areoperated in synchronization with each other.

The gate driver 12 has a function of sequentially selecting onehorizontal line, which is an object of display driving of the displaydevice 10 with a touch sensing function, based on control signalssupplied from the control unit 11.

The source driver 13 is a circuit which supplies pixel signals Vpix tosub-pixels SPix included in the display device 10 with a touch sensingfunction (see FIG. 10 to be described later) based on control signals ofimage signals Vsig supplied from the control unit 11.

The driving electrode driver 14 is a circuit which supplies drivingsignals Vcom to common electrodes COML included in the display device 10with a touch sensing function (see FIG. 7 or FIG. 8 to be describedlater) based on control signals supplied from the control unit 11.

The touch sensing unit 40 is a circuit which senses presence/absence oftouches of a finger or an input tool such as a touch pen to the touchsensing device 30, namely, a state of contact or approach to bedescribed later based on control signals supplied from the control unit11 and sensing signals Vdet supplied from the touch sensing device 30 ofthe display device 10 with a touch sensing function. Also, the touchsensing unit 40 is a circuit which obtains coordinates of touches,namely, input positions in the touch sensing region in the case wherethe touches are present. The touch sensing unit 40 includes a touchsensing signal amplifying unit 42, an A/D (Analog/Digital) convertingunit 43, a signal processing unit 44, a coordinate extracting unit 45and a sensing timing control unit 46.

The touch sensing signal amplifying unit 42 amplifies sensing signalsVdet supplied from the touch sensing device 30. The touch sensing signalamplifying unit 42 may be provided with a low pass analog filter whichremoves high frequency components, namely, noise components included inthe sensing signals Vdet and extracts and respectively outputs touchcomponents.

<Principle of Electrostatic Capacitive Touch Sensing>

Next, the principle of touch sensing in the display device 1 accordingto the present first embodiment will be described with reference to FIG.1 to FIG. 6. FIG. 2 is an explanatory diagram illustrating a state inwhich no finger contacts or approaches a touch sensing device. FIG. 3 isan explanatory diagram illustrating an example of an equivalent circuitin a state in which no finger contacts or approaches the touch sensingdevice. FIG. 4 is an explanatory diagram illustrating a state in which afinger has contacted or approached the touch sensing device. FIG. 5 isan explanatory diagram illustrating an example of an equivalent circuitin a state in which a finger has contacted or approached the touchsensing device. FIG. 6 is a diagram illustrating one example ofwaveforms of a driving signal and a sensing signal.

As illustrated in FIG. 2, in the electrostatic capacitive touch sensing,an input device referred to as a touch panel or a touch sensor includesa driving electrode E1 and a sensing electrode E2 which are disposed tobe opposed to each other with a dielectric body D interposedtherebetween. A capacitive element C1 is formed by the driving electrodeE1 and the sensing electrode E2. As illustrated in FIG. 3, one end ofthe capacitive element C1 is connected to an AC signal source S which isa driving signal source, and the other end of the capacitive elements C1is connected to a voltage sensor DET which is the touch sensing unit.The voltage sensor DET is, for example, an integrating circuit includedin the touch sensing signal amplifying unit 42 illustrated in FIG. 1.

When an AC rectangular wave Sg having a frequency in the range of, forexample, several kHz to several hundreds kHz is applied from the ACsignal source S to the one end of the capacitive element C1, namely, thedriving electrode E1, a sensing signal Vdet which is an output waveformis generated via the voltage sensor DET connected to the other end ofthe capacitive element C1, namely, the sensing electrodes E2. Note thatthe AC rectangular wave Sg corresponds to, for example, the drivingsignal Vcom illustrated in FIG. 6.

In the state in which no finger contacts or approaches, namely, in thenon-contact state illustrated in FIG. 2, current I₀ corresponding to thecapacitance value of the capacitive element C1 flows in accordance withcharge and discharge of the capacitive element C1 as illustrated in FIG.3. The voltage sensor DET converts the fluctuation in the current I₀ inaccordance with the AC rectangular wave Sg into the fluctuation involtage. The voltage fluctuation is represented as the waveform V₀indicated by a solid line in FIG. 6.

On the other hand, in a state in which a finger contacts or approaches,namely, in the contact state illustrated in FIG. 4, the capacitiveelement is affected by the electrostatic capacitance, and the capacitiveelement C2 is added in series to the capacitive element C1. In thisstate, with the charge/discharge to the capacitive elements C1 and C2,when viewed in the equivalent circuit illustrated in FIG. 5, current I₁flows through the capacitive element C. Here, the capacitive element C1′is sum of the capacitive element C1 and the capacitive element C2. Thevoltage sensor DET converts the fluctuation in the current I₁ inaccordance with the AC rectangular wave Sg into the fluctuation involtage. This voltage fluctuation is represented as the waveform V₁indicated by a broken line in FIG. 6. In this case, the amplitude of thewaveform V₁ is smaller than that of the above-described waveform V₀.Accordingly, the absolute value |ΔV| of the voltage difference betweenthe waveform V₀ and waveform V₁ is varied in accordance with influencesof an object such as a finger which approaches from outside. Note that,in order to accurately sense the absolute value |ΔV| of the voltagedifference between the waveform V₀ and the waveform V₁, it is preferablethat a period Reset during which charge and discharge of the capacitorare reset in accordance with a frequency of the AC rectangular wave Sgby the switching in the circuit is provided in the operation of thevoltage sensor DET.

In the example illustrated in FIG. 1, the touch sensing device 30performs touch sensing for each sensing block corresponding to one or aplurality of common electrodes COML in accordance with the drivingsignal Vcom supplied from the driving electrode driver 14. Morespecifically, the touch sensing device 30 outputs the sensing signalVdet via the voltage sensor DET illustrated in FIG. 3 or FIG. 5 for eachsensing block corresponding to each of the one or a plurality of commonelectrodes COML, and supplies the output sensing signal Vdet to the A/Dconverting unit 43 of the touch sensing unit 40.

The A/D converting unit 43 is a circuit which samples each analog signaloutput from the touch sensing signal amplifying unit 42 at a timing insynchronization with the driving signal Vcom, thereby converting it intoa digital signal.

The signal processing unit 44 is provided with a digital filter whichreduces frequency components other than the frequency at which thedriving signal Vcom is sampled, namely, noise components included in theoutput signal of the A/D converting unit 43. The signal processing unit44 is a logic circuit which senses presence/absence of touches to thetouch sensing device 30 based on the output signal of the A/D convertingunit 43. The signal processing unit 44 performs the process ofextracting only differential voltage caused by the finger. Thedifferential voltage caused by the finger is the absolute value |ΔV| ofthe difference between the waveform V₀ and waveform V₁ mentioned above.It is also possible that the signal processing unit 44 performscalculations of averaging absolute values |ΔV| per each sensing block toobtain the average value of the absolute values |ΔV|. By this means, thesignal processing unit 44 can reduce the influences of noise. The signalprocessing unit 44 compares the sensed differential voltage caused bythe finger with a predetermined threshold voltage, and when the voltageis equal to or higher than the threshold voltage, it is determined to bethe contact state of an externally approaching object which approachesfrom outside, and when the voltage is lower than the threshold voltage,it is determined to be the non-contact state of an externallyapproaching object. In this manner, touch sensing is performed by thetouch sensing unit 40.

The coordinate extracting unit 45 is a logic circuit which obtains thecoordinates of the position at which the touch has been sensed by thesignal processing unit 44, namely, the input position on the touchpanel. The sensing timing control unit 46 controls the A/D convertingunit 43, the signal processing unit 44 and the coordinate extractingunit 45 so that they are operated in synchronization with each other.The coordinate extracting unit 45 outputs the touch panel coordinates asa signal output Vout.

<Module>

FIG. 7 and FIG. 8 are plan views illustrating one example of a modulehaving the display device according to the first embodiment mountedtherein. In the example illustrated in FIG. 7, the above-describeddriving electrode driver 14 is formed on a first substrate 21.

As illustrated in FIG. 7, the display device 1 includes the displaydevice 10 with a touch sensing function, the driving electrode driver14, a COG (chip on glass) 19A and the first substrate 21.

The display device 10 with a touch sensing function includes a pluralityof common electrodes COML and a plurality of sensing electrodes TDL.Here, two directions which mutually intersect, preferably orthogonally,with each other within an upper surface serving as a main surface of thefirst substrate 21 are defined to be an X axis direction and a Y axisdirection. At this time, the plurality of common electrodes COMLrespectively extend in the X axis direction and are arrayed in the Yaxis direction when seen in a plan view. Further, the plurality ofsensing electrodes TDL respectively extend in the Y axis direction andare arrayed in the X axis direction when see in a plan view. In otherwords, the plurality of sensing electrodes TDL intersect the pluralityof common electrodes COML when seen in a plan view.

As will be described later with reference to FIG. 9 and FIG. 10, each ofthe plurality of common electrodes COML is provided so as to overlap theplurality of sub-pixels SPix arrayed in the X axis direction when seenin a plan view. More specifically, one common electrode COML is providedas a common electrode for the plurality of sub-pixels SPix.

Note that the expression “when seen in a plan view” in the presentspecification indicates the case in which components are seen from adirection perpendicular to the upper surface serving as the main surfaceof the first substrate 21 or a second substrate 31 included in anopposing substrate 3 described later.

In the example illustrated in FIG. 7, the display device 10 with a touchsensing function has a rectangular shape with two sides whichrespectively extend in the X axis direction and are opposed to eachother and two sides which respectively extend in the Y axis directionand are opposed to each other when seen in a plan view. A wiringsubstrate WS1 is provided on one side of the display device 10 with atouch sensing function in the Y axis direction. The sensing electrodeTDL is connected to the touch sensing unit 40 mounted on outside of thismodule via the wiring substrate WS1. As the wiring substrate WS1, aflexible print board can be used while described later by using FIGS. 12and 13. Also, a connection structure between the sensing electrode TDLand the wiring substrate WS1 will be described later by using FIGS. 12and 13.

The driving electrode driver 14 is formed on the first substrate 21. TheCOG 19A is a chip mounted on the first substrate 21 and incorporatesrespective circuits necessary for display operations such as the controlunit 11, the gate driver 12 and the source driver 13 illustrated in FIG.1.

Note that various substrates such as a transparent glass substrate or afilm made of a resin can be used as the first substrate 21.

On the other hand, the display device 1 may incorporate the drivingelectrode driver 14 in the COG. An example in which the drivingelectrode driver 14 is incorporated in the COG is illustrated in FIG. 8.In the example illustrated in FIG. 8, the display device 1 includes aCOG 19B in its module. In the COG 19B illustrated in FIG. 8, the drivingelectrode driver 14 is incorporated in addition to the above-describedrespective circuits necessary for the display operations.

Note that, as illustrated in FIG. 7 and FIG. 8, a planar shape of thesecond substrate 31 can be substantially the same as that of the firstsubstrate 21.

<Display Device with Touch Sensing Function>

Next, a configuration example of the display device 10 with a touchsensing function will be described in details. FIG. 9 is across-sectional view illustrating the display device with a touchsensing function in the display device according to the firstembodiment. FIG. 10 is a circuit diagram illustrating the display devicewith a touch sensing function in the display device according to thefirst embodiment.

The display device 10 with a touch sensing function includes a pixelsubstrate 2, an opposing substrate 3 and a liquid crystal layer 6. Theopposing substrate 3 is disposed so that an upper surface serving as amain surface of the pixel substrate 2 and a lower surface serving as amain surface of the opposing substrate 3 oppose each other. The liquidcrystal layer 6 is provided between the pixel substrate 2 and theopposing substrate 3.

The pixel substrate 2 includes the first substrate 21. As illustrated inFIG. 10, in the display region Ad, a plurality of scanning lines GCL, aplurality of signal lines SGL and a plurality of TFT elements Tr whichare thin film transistors (TFT) are formed on the first substrate 21.Note that, in FIG. 9, the illustration of the scanning lines GCL, thesignal lines SGL and the TFT elements Tr is omitted.

As illustrated in FIG. 10, the plurality of scanning lines GCLrespectively extend in the X axis direction and are arrayed in the Yaxis direction in the display region Ad. The plurality of signal linesSGL respectively extend in the Y axis direction and are arrayed in the Xaxis direction in the display region Ad. Accordingly, each of theplurality of signal lines SGL intersects the plurality of scanning linesGCL when seen in a plan view. In this manner, sub-pixels SPix arearranged at intersections between the plurality of scanning lines GCLand the plurality of signal lines SGL which intersect each other whenseen in a plan view, and a single pixel Pix is formed by a plurality ofsub-pixels SPix having different colors. More specifically, on the firstsubstrate 21, the sub-pixels SPix are arrayed in a matrix form in the Xaxis direction and the Y axis direction in the display region Ad. Inother words, the sub-pixels SPix are arrayed in a matrix form in the Xaxis direction and the Y axis direction in the display region Ad on afront surface side of the first substrate 21.

The TFT element Tr is formed at an intersecting portion at which each ofthe plurality of scanning lines GCL and each of the plurality of signallines SGL intersect each other when seen in a plan view. Accordingly, inthe display region Ad, the plurality of TFT elements Tr are formed onthe first substrate 21, and the plurality of TFT elements Tr are arrayedin a matrix form in the X axis direction and the Y axis direction. Morespecifically, each of the plurality of sub-pixels SPix is provided withthe TFT element Tr. Also, each of the plurality of sub-pixels SPix isprovided with a liquid crystal element LC in addition to the TFT elementTr.

The TFT element Tr is made up of, for example, a thin film transistorsuch as a n-channel MOS (metal oxide semiconductor). The gate electrodeof the TFT element Tr is connected to the scanning lines GCL. One of thesource electrode and the drain electrode of the TFT element Tr isconnected to the signal line SGL. The other one of the source electrodeand the drain electrode of the TFT element Tr is connected to one end ofthe liquid crystal element LC. One end of the liquid crystal element LCis connected to the source electrode or the drain electrode of the TFTelement Tr, and the other end thereof is connected to the commonelectrode COML.

As illustrated in FIG. 9, the pixel substrate 2 includes the pluralityof common electrodes COML, an insulating film 24, and a plurality ofpixel electrodes 22. The plurality of common electrodes COML areprovided on the first substrate 21 in the display region Ad (see FIG. 7or FIG. 8) on the front surface side of the first substrate 21. Theinsulating film 24 is formed on the first substrate 21 with theinclusion of the front surfaces of each of the plurality of commonelectrodes COML. In the display region Ad, a plurality of pixelelectrodes 22 are formed on the insulating film 24. Accordingly, theinsulating film 24 electrically insulates the common electrodes COML andthe pixel electrodes 22.

As illustrated in FIG. 10, each of the plurality of pixel electrodes 22is formed within each of the plurality of sub-pixels SPix arrayed in amatrix form in the X axis direction and the Y axis direction in thedisplay region Ad on the front surface side of the first substrate 21.Accordingly, the plurality of pixel electrodes 22 are arrayed in amatrix form in the X axis direction and the Y axis direction.

In the example illustrated in FIG. 9, each of the plurality of commonelectrodes COML is formed between the first substrate 21 and the pixelelectrodes 22. Also, as schematically illustrated in FIG. 10, each ofthe plurality of common electrodes COML is provided so as to overlap theplurality of pixel electrodes 22 when seen in a plan view. Then, byapplying voltage between each of the plurality of pixel electrodes 22and each of the plurality of common electrodes COML so that voltage isapplied to the liquid crystal element LC provided in each of theplurality of sub-pixels SPix, an image is displayed in the displayregion Ad.

In this manner, when the display device 10 with a touch sensing functionincludes the liquid crystal display device 20, a display control unitwhich controls image display is formed of the liquid crystal element LC,the plurality of pixel electrodes 22, the common electrodes COML, theplurality of scanning lines GCL, and the plurality of signal lines SGL.The display control unit is provided between the pixel substrate 2 andthe opposing substrate 3. Note that the display device 10 with a touchsensing function may include a display device as various display devicessuch as an organic EL display device in place of the liquid crystaldisplay device 20 as a liquid crystal display device.

Note that each of the plurality of common electrodes COML may be formedon an opposite side of the first substrate 21 across the pixelelectrodes 22. Also, in the example illustrated in FIG. 9, thearrangement of the common electrodes COML and the pixel electrodes 22 isan arrangement in which they are overlap as one example in a transverseelectric field mode. However, the arrangement of the common electrodesCOML and the pixel electrodes 22 may be an arrangement in which thecommon electrodes COML and the pixel electrodes 22 do not overlap whenseen in a plan view. Alternatively, the arrangement of the commonelectrodes COML and the pixel electrodes 22 may be an arrangement in aTN (Twisted Nematic) mode or VA (Vertical Alignment) mode serving as avertical electric field mode.

The liquid crystal layer 6 is provided to modulate light passingtherethrough in accordance with the state of the electric field, and aliquid crystal layer adapted to a transverse electric field mode such asthe above-described mode is used. More specifically, a liquid crystaldisplay device of transverse electric field mode as the liquid crystaldisplay device 20. Alternatively, as described above, a liquid crystaldisplay device of vertical electric field mode such as the TN mode orthe VA mode may be used. Note that an alignment film may be providedbetween the liquid crystal layer 6 and the pixel substrate 2 and betweenthe liquid crystal layer 6 and the opposing substrate 3 illustrated inFIG. 9, respectively.

As illustrated in FIG. 10, the plurality of sub-pixels SPix arrayed inthe X axis direction, that is, the plurality of sub-pixels SPix whichbelong to the same row of the liquid crystal display device 20 areconnected to each other by the scanning line GCL. The scanning lines GCLare connected to the gate driver 12 (see FIG. 1) and scanning signalsVscan (see FIG. 1) are supplied thereto from the gate driver 12. Also,the plurality of sub-pixels SPix arrayed in the Y axis direction, thatis, the plurality of sub-pixels SPix which belong to the same column ofthe liquid crystal display device 20 are connected to each other by thesignal line SGL. The signal lines SGL are connected to the source driver13 (see FIG. 1) and pixel signals Vpix (see FIG. 1) are supplied theretofrom the source driver 13. Further, the plurality of sub-pixels SPixarrayed in the X axis direction, that is, the plurality of sub-pixelsSPix which belong to the same row of the liquid crystal display device20 are connected to each other by the common electrode COML.

The common electrodes COML are connected to the driving electrode driver14 (see FIG. 1) and driving signals Vcom (see FIG. 1) are suppliedthereto from the driving electrode driver 14. In other words, in theexample illustrated in FIG. 10, the plurality of sub-pixels SPix whichbelong to the same row share one common electrode COML. The plurality ofcommon electrodes COML respectively extend in the X axis direction andare arrayed in the Y axis direction in the display region Ad. Asdescribed above, since the plurality of scanning lines GCL respectivelyextend in the X axis direction and are arrayed in the Y axis directionin the display region Ad, the direction in which each of the pluralityof common electrodes COML extends is parallel to the direction in whicheach of the plurality of scanning lines GCL extends. However, thedirection in which each of the plurality of common electrodes COMLextends is not limited, and for example, the direction in which each ofthe plurality of common electrodes COML extends may be a direction whichis parallel to the direction in which each of the plurality of signallines SGL extends.

The gate driver 12 illustrated in FIG. 1 sequentially selects one row,namely, one horizontal line from among the sub-pixels SPix which arearrayed in a matrix form in the liquid crystal display device 20 as anobject of display driving by applying the scanning signals Vscan to thegate electrode of the TFT element Tr of each of the sub-pixels SPix viathe scanning lines GCL illustrated in FIG. 10. The source driver 13illustrated in FIG. 1 supplies the pixel signals Vpix to each of theplurality of sub-pixels SPix which constitute one horizontal linesequentially selected by the gate driver 12 via the signal lines SGLillustrated in FIG. 10. Then, displays in accordance with the suppliedpixel signals Vpix are made at the plurality of sub-pixels SPixconstituting one horizontal line.

The driving electrode driver 14 illustrated in FIG. 1 applies drivingsignals Vcom to drive the common electrodes COML for each of the sensingblocks corresponding to one or a plurality of common electrodes COML.

In the liquid crystal display device 20, the gate driver 12 is driven soas to sequentially scan the scanning lines GCL on time division basis,thereby sequentially selecting the sub-pixels SPix for each horizontalline. Also, in the liquid crystal display device 20, the source driver13 supplies pixel signals Vpix to the sub-pixels SPix which belong toone horizontal line, so that displays are made for each horizontal line.In performing the display operation, the driving electrode driver 14applies driving signals Vcom to a sensing block including the commonelectrodes COML corresponding to the one horizontal line.

The common electrodes COML of the display device 1 according to thepresent first embodiment operate as driving electrodes of the liquidcrystal display device 20 and also operate as driving electrodes of thetouch sensing device 30. FIG. 11 is a perspective view illustrating oneconfiguration example of the driving electrodes and the sensingelectrodes of the display device according to the present firstembodiment.

The touch sensing device 30 includes a plurality of common electrodesCOML provided on the pixel substrate 2 and a plurality of sensingelectrodes TDL provided on the opposing substrate 3. The plurality ofsensing electrodes TDL respectively extend in the direction whichintersects the direction in which each of the plurality of commonelectrodes COML extends when seen in a plan view. In other words, theplurality of sensing electrodes TDL are provided at intervals so as torespectively overlap the plurality of common electrodes COML when seenin a plan view. Also, each of the plurality of sensing electrodes TDLopposes the common electrodes COML in a direction which is perpendicularto the front surface of the first substrate 21 included in the pixelsubstrate 2. Each of the plurality of sensing electrodes TDL isrespectively connected to the touch sensing signal amplifying unit 42(see FIG. 1) of the touch sensing unit 40. Electrostatic capacitance isgenerated at intersecting portions between each of the plurality ofcommon electrodes COML and each of the plurality of sensing electrodesTDL seen in a plan view. Thus, input positions are sensed based on theelectrostatic capacitance between each of the plurality of commonelectrodes COML and each of the plurality of sensing electrodes TDL.More specifically, by the electrode substrate as the second substrate 31(see FIG. 9) on which the sensing electrode TDL is formed and the commonelectrodes COML, a sensing unit for sensing the input position, that is,an input device is formed.

Note that the electrode substrate in the first embodiment is not limitedto the case of the usage as the opposing substrate 3, and, for example,a single input device can be formed as described later by using FIG. 38.

With the configuration described above, when performing the touchsensing operation in the touch sensing device 30, one sensing blockcorresponding to one or a plurality of common electrodes COML in ascanning direction Scan is sequentially selected by the drivingelectrode driver 14. Then, in the selected sensing block, drivingsignals Vcom for measuring the electrostatic capacitance between thecommon electrodes COML and the sensing electrodes TDL are input to thecommon electrodes COML, and sensing signals Vdet for sensing inputpositions are output from the sensing electrodes TDL. In this manner,the touch sensing device 30 is configured so as to perform the touchsensing for each sensing block. More specifically, one sensing blockcorresponds to the driving electrode E1 of the above-described principleof touch sensing, and the sensing electrode TDL corresponds to thesensing electrode E2.

Note that a range of the sensing block in the display operation and arange of the sensing block in the touch sensing operation may be commonwith or different from each other.

As illustrated in FIG. 11, the plurality of common electrodes COML andthe plurality of sensing electrodes TDL which intersect each other whenseen in a plan view form an electrostatic capacitive touch sensor havinga matrix arrangement. Accordingly, by scanning the entire touch sensingsurface of the touch sensing device 30, positions which have beencontacted or approached by a finger or the like can be sensed.

As illustrated in FIG. 9, the opposing substrate 3 includes a secondsubstrate 31, a color filter 32, sensing electrodes TDL and a protectivefilm 33. The second substrate 31 has an upper surface serving as a mainsurface and a lower surface serving as a main surface opposed to theupper surface. The color filter 32 is formed on the lower surfaceserving as one main surface of the second substrate 31. The sensingelectrodes TDL are the sensing electrodes of the touch sensing device30, and are formed on the upper surface serving as the other mainsurface of the second substrate 31. The protective film 33 is formed onthe upper surface of the second substrate 31 so as to cover the sensingelectrodes TDL. Note that shapes of the sensing electrode TDL as anelectrode and the protective film 33 will be described later.

For example, color filters colored in three colors of red (R), green (G)and blue (B) are arrayed in the X axis direction as the color filter 32.In this manner, as illustrated in FIG. 10, a plurality of sub-pixelsSPix corresponding to each of color regions 32R, 32G and 32B of thethree colors of R, G and B are formed, and one pixel Pix is formed byone set of the plurality of sub-pixels SPix each corresponding to thecolor regions 32R, 32G and 32B. The pixels Pix are arrayed in a matrixform in the direction in which the scanning lines GCL extend (X axisdirection) and the direction in which the signal lines SGL extend (Yaxis direction). Further, the region in which the pixels Pix are arrayedin a matrix form is the above-described display region Ad. Note that adummy region where the pixels P is are arranged in a matrix form may beprovided in periphery of the display region Ad.

The combination of colors of the color filter 32 may be anothercombination including a plurality of colors other than R, G and B. It isalso possible to provide no color filter 32. Alternatively, one pixelPix may include a sub-pixel SPix which is not provided with the colorfilter 32, that is, a white-colored sub-pixel SPix. Further, a colorfilter may be provided to the pixel substrate 2 by use of a COA (Colorfilter On Array) technique.

Note that, as illustrated in FIG. 9, a polarizing plate 25 may beprovided on the opposite side of the opposing substrate 3 with the pixelsubstrate 2 interposed therebetween. In addition, a polarizing plate 34may be provided on the opposite side of the pixel substrate 2 with theopposing substrate 3 interposed therebetween.

<Configuration of Electrode Substrate>

Next, a configuration of the electrode substrate will be described withreference to FIGS. 12 to 15. Note that, in the description of the firstembodiment, an electrode substrate used as an opposing substrate towhich sensing electrodes are formed in a display device with an inputdevice is taken as an example.

FIG. 12 is a plan view illustrating the electrode substrate according tothe first embodiment. FIGS. 13 and 14 are cross-sectional viewsillustrating an electrode substrate according to the first embodiment.FIG. 15 is a perspective view illustrating an electrode substrateaccording to the first embodiment. FIG. 13 is a cross-sectional viewtaken along the line A-A of FIG. 12, and FIG. 14 is a cross-sectionalview taken along the line B-B of FIG. 12. Note that, in FIG. 12, aperspective state in which the wiring substrate WS1 and the anisotropicconductive film CF1 are eliminated is illustrated and the outerperipheries of the wiring substrate WS1 and the anisotropic conductivefilm CF1 are represented by a dashed-two dotted line. In addition, inFIG. 15, the illustration of the wiring substrate WS1 is omitted.Further, FIG. 15 illustrates the similar example of the firstmodification example of a concave/convex pattern UE1 described later byusing FIG. 19.

The electrode substrate ES as the opposing substrate 3 includes thesecond substrate 31, the sensing electrode TDL, the protective film 33,and a concave/convex pattern UE1.

Note that, in the present specification, the “concave/convex pattern”means a pattern formed of concave portions, a pattern formed of convexportions, or a pattern formed of concave portions and convex portions.

The second substrate 31 includes a region (first region) AR1, a region(second region) AR2, and a region (third region) AR3 as regions on anupper surface serving as a main surface of the second substrate 31.Hereinafter, two directions which mutually intersect, preferablyorthogonally, with each other within the upper surface serving as a mainsurface of the second substrate 31 are defined to be an X axis directionand a Y axis direction. Here, the regions AR1, AR2, and AR3 aresequentially arranged in the Y axis direction when seen in a plan view.

Note that, as described above, the expression “when seen in a plan view”in the present specification indicates the case in which components areseen from a direction perpendicular to the upper surface serving as themain surface of the first substrate 21 (see FIG. 9) or the upper surfaceserving as the main surface of the second substrate 31.

Also, various substrates such as a transparent glass substrate or a filmmade of a resin can be used as the second substrate 31.

The sensing electrode TDL is continuously formed on the second substrate31 from the region AR1 on the upper surface of the second substrate 31via the region AR2 on the upper surface of the second substrate 31 overthe region AR3 on the upper surface of the second substrate 31.Preferably, the sensing electrode TDL extends in the Y axis directionwhen seen in a plan view.

A portion of the sensing electrode TDL formed in the region AR1 is takenas a portion PR1. The portion PR1 is a main body portion MP1 of thesensing electrode TDL. Also, a portion of the sensing electrode TDLformed in the region AR2 is taken as a portion PR2. Furthermore, aportion of the sensing electrode TDL formed in the region AR3 is takenas a portion PR3. The portion PR3 is an electrode terminal ET1electrically connected to the wiring substrate WS1. In other words, theportion PR3 is an electrode pad electrically connected to the wiringsubstrate WS1. The sensing electrode TDL is formed of a conductive film.

Preferably, the sensing electrode TDL is formed of a single-layer or amulti-layer film of a conductive film having a metal layer or an alloylayer made of one or more metals selected from a group includingaluminum (Al), copper (Cu), silver (Ag), molybdenum (Mo), chrome (Cr)and tungsten (W). In this manner, conductivity of the sensing electrodeTDL can be improved and thus the sensing sensitivity or sensing speed ofthe sensing electrode TDL can be improved.

Note that the first embodiment shows an example in which the portion PR2is included in the electrode terminal ET1 as a portion of the electrodeET1 on a main body portion MP1 side. However, the portion PR2 may beincluded in the main body portion MP1 as a portion of the main bodyportion MP1 on an electrode terminal ET1 side.

Also, while the plan shape of the electrode terminal ET1 is arectangular shape in the example illustrated in FIG. 12, the plan shapeof the electrode terminal ET1 may be various shapes such as a circularshape.

The sensing electrode TDL may include a plurality of conductive linesarrayed in the X axis direction in the region AR1. Here, each of theplurality of conductive lines may have a zigzag shape extending in the Yaxis direction as a whole while being alternately bent in oppositedirections when seen in a plan view. Alternatively, the sensingelectrode TDL may have a mesh shape formed of the plurality ofconductive lines when seen in a plan view.

The opposing substrate 3 has a plurality of sensing electrodes TDL. Theplurality of sensing electrodes TDL are arrayed in, for example, the Xaxis direction.

The protective film 33 is formed so as to cover the sensing electrodesTDL in the regions AR1 and AR2. The protective film 33 protects thesensing electrodes TDL formed of the conductive film by preventingmoisture in the air, an acid organic substance, or the like fromcontacting the sensing electrodes TDL so that the sensing electrodes TDLare not corroded. As the protective film 33, for example, a resin filmformed of ultraviolet (UV) setting resin, thermosetting resin, or bothof them each made of acryl resin, epoxy resin, polyimide resin, or elsemay be used. Note that the protective film 33 has also a function offlattening the upper surface of the second substrate 31 in which thesensing electrodes TDL are formed.

The concave/convex pattern UE1 is formed on a surface of the portion PR2or in a portion of the region AR2 positioned in periphery of the sensingelectrode TDL on the second substrate 31. In other words, theconcave/convex pattern UE1 is formed in the sensing electrode TDL or thesecond substrate 31.

In addition, an end portion of the protective film 33 on the region AR3side terminates on the concave/convex pattern UE1. In other words, anend portion EP1 of the protective film 33 on the region AR3 side ispositioned on the concave/convex pattern UE1.

As described above, the concave/convex pattern UE1 includes, forexample, concave portions or convex portions. More specifically, theconcave/convex pattern UE1 includes step portions made up of ahigh-level portion and a low-level portion. When applying the coatingliquid for forming a protective film 33 onto the regions AR1 and AR2,the coating liquid easily spreads along the step portion, but it isdifficult for the coating liquid to spread in the direction intersectingthe step portion. Therefore, by adjusting the shape of theconcave/convex pattern UE1, a length of the step portion can beadjusted, so that the position of the end portion of the coating liquidapplied on the region AR2 can be accurately adjusted. More specifically,the concave/convex pattern UE1 is a position adjustment pattern foradjusting the position of the end portion EP1 of the protective film 33.

As illustrated in FIG. 14, a thickness TH1 of the protective film 33 canbe made thicker than a thickness TH2 of the sensing electrode TDL. Forexample, the thickness TH2 of the sensing electrode TDL can be 10 nm to2000 nm, and the thickness TH1 of the protective film 33 can be 500 nmto 10000 nm. Also, when the thickness TH1 of the protective film 33,that is, the thickness of the coating liquid for forming a protectivefilm, is twice as large as the thickness TH2 of the sensing electrodeTDL or larger, an effect of highly accurately adjusting the position ofthe end portion the coating liquid applied on the region AR2 is enhancedby the provision of the concave/convex pattern UE1.

Note that, in the example illustrated in FIG. 12, the concave/convexpattern UE1 is formed on the second substrate 31 in a portion of theregion AR2 positioned on the periphery of the sensing electrode TDL.Also, the protective film 33 is terminated on the concave/convex patternUE1 and on the portion PR2. In other words, the end portion EP1 of theprotective film 33 on the region AR3 side is positioned on theconcave/convex pattern UE1 and on the portion PR2.

Here, it is assumed that the X axis direction and the Y axis directionare orthogonal to each other and the portion PR1 has a width WD1 in theX axis direction, the portion PR2 has a width WD2 in the X axisdirection, and the portion PR3 has a width WD3 in the X axis direction.Here, preferably, the width WD2 of the portion PR2 in the X axisdirection is larger than the width WD1 of the portion PR1 in the X axisdirection. With this, the portion PR2 has a shoulder portion SH1 and, itis possible to prevent or suppress the coating liquid for forming aprotective film applied on the region AR1 from spreading toward theregion AR2 by the shoulder portion SH1. Consequently, the position ofthe end portion of the coating liquid applied on the region AR2 can behighly accurately adjusted.

Note that FIG. 12 illustrates an example in which the width WD2 of theportion PR2 in the X axis direction is larger than the width WD1 of theportion PR1 in the X axis direction, and FIG. 15 illustrates an examplein which the width WD2 of the portion PR2 in the X axis direction isequal to the width WD1 of the portion PR1 in the X axis direction. Also,FIG. 12 illustrates an example in which the width WD3 the portion PR3 inthe X axis direction is equal to the width WD2 of the portion PR2 in theX axis direction, and FIG. 15 illustrates an example in which the widththe portion PR3 in the X axis direction is equal to the width of theportion PR2 in the X axis direction.

For example, in the case illustrated in FIG. 12, that is, when the widthWD2 is larger than the width WD1 and is equal to the width WD3, thewidths WD2 and WD3 are, for example, 50 μm to 1000 μm each. Also, forexample, in the case illustrated in FIG. 12, a space DS1 between twoelectrode terminals ET1 adjacent to each other is, for example, 50 μm to1000 μm. With the space DS1 within such a range, it is possible toprevent or suppress the two electrode terminals ET1 adjacent to eachother from being short-circuited by an anisotropic conductive film CF1described later.

Also, the electrode substrate ES serving as the opposing substrate 3 mayhave the anisotropic conductive film (ACF) CF1 and a wiring substrateWS1. The anisotropic conductive film CF1 is disposed in the regions AR2and AR3 so as to cover the sensing electrode TDL. The wiring substrateWS1 is disposed on the anisotropic conductive film CF1. As the wiringsubstrate WS1, for example, a flexible printed wiring board alsoreferred to as flexible printed circuits (FPC) can be used. Hereinafter,an example of using FPC as the wiring substrate WS1 is described.

On a lower surface of the wiring substrate WS1 serving as a main surfacethereof, a plurality of electrode terminals ET2 are formed. That is, thewiring substrate WS1 includes the plurality of electrode terminals ET2formed on the lower surface serving as the main surface of the wiringsubstrate WS1. The plurality of electrode terminals ET2 are disposed soas to correspond to each of the electrode terminals ET1 of the pluralityof sensing electrodes TDL, respectively. The wiring substrate WS1 isdisposed on the anisotropic conductive film CF1 so that the plurality ofelectrode terminals ET2 are opposed to the electrode terminals ET1,respectively, which are portions of the plurality of sensing electrodesTDL formed in the region AR3, via the anisotropic conductive film CF1.

The anisotropic conductive film CF1 is a film formed by shaping amixture of thermosetting resin with conductive fine metal particles intoa film. With the anisotropic conductive film CF1 interposed between theelectrode terminals ET1 of the sensing electrode TDL and the electrodeterminals ET2 of the wiring substrate WS1, the wiring substrate WS1 ispressed onto the second substrate 31 by, for example, a heat treatment.With this, the metal particles in the anisotropic conductive film CF1contact each other in a thickness direction of the anisotropicconductive film CF1 to form a conductive path in the thickness directionof the anisotropic conductive film CF1. The electrode terminals ET1 andthe electrode terminals ET2 opposed to each other are electricallyconnected to each other via the anisotropic conductive film CF1.

Preferably, an end portion EP2 of the anisotropic conductive film CF1 onthe region AR1 side overrides the protective film 33 to be terminated onthe protective film 33. In other words, the end portion EP2 of theanisotropic conductive film CF1 on the region AR1 side is positioned onthe protective film 33.

With this, any portion of the portion PR2 is covered with either one ofthe protective film 33 and the anisotropic conductive film CF1, andmoisture in the air can be prevented from contacting any portion of theportion PR2. Therefore, the sensing electrode TDL formed of a conductivefilm can be reliably protected from corrosion.

<Concave/Convex Pattern>

FIG. 16 is a plan view illustrating the concave/convex pattern in theelectrode substrate of the first embodiment.

As illustrated in FIG. 16, in the first embodiment, the concave/convexpattern UE1 includes a projecting portion PJ1. The projecting portionPJ1 is formed so as to project and extend from a side surface of theportion PR2 of the sensing electrode TDL extending in the Y axisdirection formed in the region AR2 toward the X axis direction, whenseen in a plan view. Therefore, the concave/convex pattern UE1 is formedon the side surface of the portion PR2 and the protective film 33 isterminated on the concave/convex pattern UE1 and on the portion PR2 asillustrated in FIG. 12 and FIG. 13. In other words, the end portion EP1of the protective film 33 on the region AR3 side is positioned on theconcave/convex pattern UE1 and on the portion PR2. Note that theprojecting portion PJ1 is also a convex portion formed on the secondsubstrate 31.

In this manner, the projecting portion PJ1 serving as a step portion canincrease the length of the outer periphery of the portion PR2 of thesensing electrode TDL formed in the region AR2, and the projectingportion PJ1 serving as a side wall of the step portion can increase thearea of the side surface of the portion PR2 of the sensing electrode TDLformed in the region AR2. That is, the length of the step portion can beincreased. Consequently, it is possible to prevent or suppress thecoating liquid for forming a protective film applied on the region AR2from spreading toward the region AR3 side, and the position of the endportion of the coating liquid applied on the region AR2 can be highlyaccurately adjusted.

Preferably, the concave/convex pattern UE1 includes a plurality ofprojecting portions PJ1. The plurality of projecting portions PJ1 areformed so as to extend in the X axis direction as projecting from theside surface of the portion PR2 of the sensing electrode TDL extendingin the Y axis direction formed in the region AR2, and are arrayed in theY axis direction, when seen in a plan view. With this, it is possible toeasily prevent or suppress the coating liquid for forming a protectivefilm applied on the region AR2 from spreading toward the region AR3side. Consequently, the position of the end portion of the coatingliquid applied on the region AR2 can be easily highly accuratelyadjusted.

Also, in the first embodiment, sensing electrodes TDL1 and TDL2 areprovided as two sensing electrodes TDL each extending in the Y axisdirection and adjacent to each other in the X axis direction when seenin a plan view. As illustrated in FIG. 12 and FIG. 13, in the regionsAR1 and AR2, the protective film 33 is formed so as to cover the twosensing electrodes TDL and also cover a portion of the second substrate31 positioned between the two sensing electrodes TDL.

A concave/convex pattern UE111 serving as the concave/convex pattern UE1provided so as to correspond to the sensing electrode TDL1 includes aplurality of projecting portions PJ111 serving as the projecting portionPJ1, and a concave/convex pattern UE112 serving as the concave/convexpattern UE1 provided so as to correspond to the sensing electrode TDL1includes a plurality of projecting portions PJ112 serving as theprojecting portion PJ1. The plurality of projecting portions PJ111 eachproject and extend in the X axis direction from a side surface oppositeto a sensing electrode TDL2 side of a portion PR21 serving as theportion PR2 of the sensing electrode TDL1 formed in the region AR2 to aside opposite to the sensing electrode TDL2 side, and are arrayed in theY axis direction. The plurality of projecting portions PJ112 eachproject and extend in the X axis direction from a side surface of theportion PR21 on the sensing electrode TDL2 side to the sensing electrodeTDL2 side, and are arrayed in the Y axis direction.

Also, a concave/convex pattern UE121 serving as the concave/convexpattern UE1 provided so as to correspond to the sensing electrode TDL2includes a plurality of projecting portions PJ121 serving as theprojecting portion PJ1, and a concave/convex pattern UE122 serving asthe concave/convex pattern UE1 provided so as to correspond to thesensing electrode TDL2 includes a plurality of projecting portions PJ122serving as the projecting portion PJ1. The plurality of projectingportions PJ121 each project and extend in the X axis direction from aside surface on a sensing electrode TDL1 side of a portion PR22 servingas the portion PR2 of the sensing electrode TDL2 formed in the regionAR2, and are arrayed in the Y axis direction. The plurality ofprojecting portions PJ122 each project and extend in the X axisdirection from a side surface opposite to a sensing electrode TDL1 sideof the portion PR22 toward a side opposite to the sensing electrode TDL1side, and are arrayed in the Y axis direction. Note that the pluralityof projecting portions PJ112 and the plurality of projecting portionsPJ121 may be disposed in a staggered configuration in the Y axisdirection as similar to an example described later by using FIG. 19.

As illustrated in FIG. 16, when the projecting portions PJ112 and theprojecting portions PJ121 are provided, a minimum distance between twosensing electrodes TDL1 and TDL2 adjacent to each other is equal to aminimum distance DS2 between the projecting portions PJ112 and theprojecting portions PJ121 in the X axis direction. In this case,preferably, the minimum distance DS2 between the projecting portionsPJ112 and the projecting portions PJ121 in the X axis direction islarger than an average particle diameter of the conductive particlescontained in the anisotropic conductive film CF1 (see FIG. 12 and FIG.13). With this, it is possible to prevent or suppress the projectingportions PJ112 and the projecting portions PJ121 from beingshort-circuited by the conductive particles contained in the anisotropicconductive film CF1 (see FIG. 12 and FIG. 13).

More preferably, the minimum distance DS2 between the projectingportions PJ112 and the projecting portions PJ121 in the X axis directionis three times as large as the average particle diameter of theconductive particles contained in the anisotropic conductive film CF1 orlarger (see FIG. 12 and FIG. 13). Alternatively, when the averageparticle diameter of the conductive particles is, for example, smallerthan 5000 nm, the minimum distance DS2 between the projecting portionsPJ112 and the projecting portions PJ121 in the X axis direction ispreferably, for example, 15000 nm to 50000 nm. With this, it is possibleto easily prevent or suppress the projecting portions PJ112 and theprojecting portions PJ121 from being short-circuited by the conductiveparticles contained in the anisotropic conductive film CF1 (see FIG. 12and FIG. 13).

Note that, for example, when the plurality of projecting portions PJ112are provided but the plurality of projecting portions PJ121 are notprovided, the minimum distance between two sensing electrodes TDL1 andTDL2 adjacent to each other is equal to a minimum distance between aside surface of the sensing electrode TDL2 on a sensing electrode TDL1side and the projecting portions PJ112 in the X axis direction. Also inthis case, preferably, a minimum distance between the side surface ofthe sensing electrode TDL2 on the sensing electrode TDL1 side and theprojecting portions PJ112 in the X axis direction is larger than theaverage particle diameter of the conductive particles contained in theanisotropic conductive film CF1 (see FIG. 12 and FIG. 13). Furthermore,more preferably, the minimum distance between the side surface of thesensing electrode TDL2 on the sensing electrode TDL1 side and theprojecting portions PJ112 in the X axis direction is three times aslarge as the average particle diameter of the conductive particlescontained in the anisotropic conductive film CF1 (see FIG. 12 and FIG.13) or larger.

In this manner, the adjacent sensing electrodes TDL1 and TDL2 arepreferably disposed so as to have a similar minimum distance between anyportions thereof in not only the X axis direction and the Y axisdirection but also any direction.

Note that, as similar to the description by using FIG. 12, the width WD2of the portion PR2 in the X axis direction is larger than the width WD1of the portion PR1 in the X axis direction. With this, the shoulderportion SH1 can prevent or suppress the coating liquid for forming aprotective film applied on the region AR1 from spreading toward theregion AR2.

FIG. 17 and FIG. 18 are cross-sectional views illustrating otherexamples of the concave/convex pattern in the electrode substrate of thefirst embodiment. FIG. 17 and FIG. 18 are cross-sectional views whenseen from a direction in which the projecting portion PJ1 extends. Also,illustration of the protective film 33 is omitted in FIG. 17 and FIG.18.

As illustrated in FIG. 17 and FIG. 18, the projecting portion PJ1 as aconvex portion includes a side surface portion SS1 positioned, forexample, on one side (left side in FIG. 17) in the Y axis directionorthogonal to the X axis direction when seen in a plan view, and anupper end portion HE1 of the side surface portion SS1 is positionedcloser to the one side (left side in FIG. 17) than a lower end portionLE1 of the side surface portion SS1 in the Y axis direction. Also, theprojecting portion PJ1 includes a side surface portion SS2 positioned,for example, on the other side (right side in FIG. 17) in the Y axisdirection orthogonal to the X axis direction when seen in a plan view,and an upper end portion HE2 of the side surface portion SS2 ispositioned closer to the other side (right side in FIG. 17) than a lowerend portion LE2 of the side surface portion SS2 in the Y axis direction.

In the example illustrated in FIG. 17, the projecting portion PJ1includes a lower layer portion LL1 formed on the second substrate 31 andan upper layer portion HL1 formed on the lower layer portion LL1. A sidesurface portion LS1 of the lower layer portion LL1 on one side (leftside in FIG. 17) in the Y axis direction is retreated in the Y axisdirection to a side opposite to the one side (left side in FIG. 17)further than a side surface portion HS1 of the upper layer portion HL1on one side (left side in FIG. 17) in the Y axis direction. Also, a sidesurface portion LS2 of the lower layer portion LL1 on the other side(right side in FIG. 17) in the Y axis direction is retreated in the Yaxis direction to a side opposite to the other side (right side in FIG.17) further than a side surface portion HS2 of the upper layer portionHL1 on the other side (right side in FIG. 17) in the Y axis direction.With this, the upper end portion HE1 of the side surface portion SS1 ispositioned closer to one side (left side in FIG. 17) than the lower endportion LE1 of the side surface portion SS1 in the Y axis direction, andthe upper end portion HE2 of the side surface portion SS2 is positionedcloser to the other side (right side in FIG. 17) than the lower endportion LE2 of the side surface portion SS2 in the Y axis direction.

Also, in the example illustrated in FIG. 18, a cross-sectional shapeperpendicular to the direction in which the projecting portion PJ1extends is an inverted trapezoidal shape. That is, in a cross sectionperpendicular to the direction in which the projecting portion PJ1extends, either one or both of the side surfaces of the projectingportion PJ1 are tilted so that the width of the projecting portion PJ1is decreased from the upper surface of the projecting portion PJ1 towardthe lower surface of the projecting portion PJ1.

The projecting portion PJ1 as the convex portion has such across-sectional shape, so that the effect of stopping the coating liquidon the upper side of the step portion ST1 described later by using FIG.31 is enhanced. Consequently, the position of the end portion of thecoating liquid can be further highly accurately adjusted.

In the example illustrated in FIG. 17, after the lower layer portion LL1and the upper layer portion HL1 are laminated so that, for example, theetching speed of the lower layer portion LL1 with respect to an etchantis higher than the etching speed of the upper layer portion HL1 withrespect to that etchant, etching is performed by using that etchant.With this, the projecting portion PJ1 can be formed so that the upperend portion HE1 of the side surface portion SS1 is positioned closer toone side (left side in FIG. 17) than the lower end portion LE1 of theside surface portion SS1 in the Y axis direction and is positionedcloser to the other side (right side in FIG. 17) than the lower endportion LE2 of the side surface portion SS2 in the Y axis direction (thesame goes for each of the following modification examples).

Alternatively, a portion of the side surface of the projecting portionPJ1 other than the upper end portion may partially have a constrictedportion (the same goes for each of the following modification examples).

First Modification Example of Concave/Convex Pattern

FIG. 19 is a plan view illustrating a first modification example of theconcave/convex pattern in the electrode substrate of the firstembodiment.

As illustrated in FIG. 19, in the first modification example, theconcave/convex pattern UE1 includes a projecting portion PJ2. Theprojecting portion PJ2 is formed so as to project and extend from a sidesurface of the portion PR2 of the sensing electrode TDL extending in theY axis direction formed in the region AR2 toward the X axis direction,when seen in a plan view. Therefore, the concave/convex pattern UE1 isformed on the side surface of the portion PR2 and the protective film 33is terminated on the concave/convex pattern UE1 and on the portion PR2as illustrated in FIG. 12, FIG. 13, and FIG. 15. In other words, the endportion EP1 of the protective film 33 on a region AR3 side is positionedon the concave/convex pattern UE1 and on the portion PR2. Note that theprojecting portion PJ2 is also a convex portion formed on the secondsubstrate 31.

In this manner, the projecting portion PJ2 serving as a step portion canincrease the length of the outer periphery of the portion PR2 of thesensing electrode TDL formed in the region AR2, and the projectingportion PJ2 serving as a side wall of the step portion can increase thearea of the portion PR2 of the sensing electrode TDL formed in theregion AR2. That is, the length of the step portion can be increased.Consequently, it is possible to prevent or suppress the coating liquidfor forming a protective film applied on the region AR2 from spreadingtoward the region AR3 side, and the position of the end portion of thecoating liquid applied on the region AR2 can be highly accuratelyadjusted.

Preferably, the concave/convex pattern UE1 includes a plurality ofprojecting portions PJ2. The plurality of projecting portions PJ2 areformed so as to extend in the X axis direction as projecting from theside surface of the portion PR2 of the sensing electrode TDL extendingin the Y axis direction formed in the region AR2, when seen in a planview, and are arrayed in the Y axis direction. With this, it is possibleto easily prevent or suppress the coating liquid for forming aprotective film applied on the region AR2 from spreading toward theregion AR3 side. Consequently, the position of the end portion of thecoating liquid applied on the region AR2 can be highly accuratelyadjusted with ease.

Also, in the first modification example, sensing electrodes TDL1 andTDL2 are provided as two sensing electrodes TDL each extending in the Xaxis direction and adjacent to each other in the Y axis direction whenseen in a plan view. As illustrated in FIG. 12, FIG. 13, and FIG. 15,the protective film 33 is formed so as to cover the two sensingelectrodes TDL and also cover a portion of the second substrate 31positioned between the two sensing electrodes TDL in the regions AR1 andAR2.

The concave/convex pattern UE111 serving as the concave/convex patternUE1 provided so as to correspond to the sensing electrode TDL1 includesa plurality of projecting portions PJ211 serving as the projectingportion PJ2, and the concave/convex pattern UE112 serving as theconcave/convex pattern UE1 provided so as to correspond to the sensingelectrode TDL1 includes a plurality of projecting portions PJ212 servingas the projecting portion PJ2. The plurality of projecting portionsPJ211 each project and extend in the X axis direction from a sidesurface opposite to a sensing electrode TDL2 side of the portion PR21serving as the portion PR2 of the sensing electrode TDL1 formed in theregion AR2 to a side opposite to the sensing electrode TDL2 side, andare arrayed in the Y axis direction. The plurality of projectingportions PJ212 each project and extend in the X axis direction from aside surface of the portion PR21 on the sensing electrode TDL2 side tothe sensing electrode TDL2 side, and are arrayed in the Y axisdirection.

Also, the concave/convex pattern UE121 serving as the concave/convexpattern UE1 provided so as to correspond to the sensing electrode TDL2includes a plurality of projecting portions PJ221 serving as theprojecting portion PJ2, and the concave/convex pattern UE122 serving asthe concave/convex pattern UE1 provided so as to correspond to thesensing electrode TDL2 includes a plurality of projecting portions PJ222serving as the projecting portion PJ2. The plurality of projectingportions PJ221 each project and extend in the X axis direction from aside surface on a sensing electrode TDL1 side of a portion PR22 servingas the portion PR2 of the sensing electrode TDL2 formed in the regionAR2, and are arrayed in the Y axis direction. The plurality ofprojecting portions PJ222 each project and extend in the X axisdirection from a side surface of the portion PR22 opposite to a sensingelectrode TDL1 side toward a side opposite to the sensing electrode TDL1side, and are arrayed in the Y axis direction.

In the first modification example, as illustrated in FIG. 19, an endportion EG12 of the projecting portion PJ212 on the sensing electrodeTDL2 side is disposed closer to a sensing electrode TDL2 side than anend portion EG21 of the projecting portion PJ221 on a sensing electrodeTDL1 side in the X axis direction. Also, each of the plurality ofprojecting portions PJ212 and the each of the plurality of projectingportions PJ221 are alternately disposed along the Y axis direction.Therefore, the plurality of projecting portions PJ212 and the pluralityof projecting portions PJ221 are disposed in a staggered configurationin the Y axis direction.

With this, when the coating liquid for forming a protective film appliedon a portion of the second substrate 31 positioned between two sensingelectrodes TDL adjacent to each other in the region AR2 spreads towardthe region AR3 side, the number of intersecting step portions isincreased. With this, it is possible to easily prevent or suppress thecoating liquid for forming a protective film applied on the region AR2from spreading toward the region AR3 side. Consequently, the position ofthe end portion of the coating liquid applied on the region AR2 can behighly accurately adjusted with ease.

As illustrated in FIG. 19, when the projecting portions PJ212 and theprojecting portions PJ221 are provided, a minimum distance between twosensing electrodes TDL1 and TDL2 adjacent to each other is equal to aminimum distance DS3 between the projecting portions PJ212 and theprojecting portions PJ221 in the Y axis direction. In this case,preferably, the minimum distance DS3 between the projecting portionsPJ212 and the projecting portions PJ221 in the Y axis direction islarger than the average particle diameter of the conductive particlescontained in the anisotropic conductive film CF1 (see FIG. 12 and FIG.13). With this, it is possible to prevent or suppress the projectingportions PJ212 and the projecting portions PJ221 from beingshort-circuited by the conductive particles contained in the anisotropicconductive film CF1 (see FIG. 12 and FIG. 13).

More preferably, the minimum distance DS3 between the projectingportions PJ212 and the projecting portions PJ221 in the Y axis directionis three times as large as the average particle diameter of theconductive particles contained in the anisotropic conductive film CF1 orlarger (see FIG. 12 and FIG. 13). Alternatively, when the averageparticle diameter of the conductive particles is, for example, smallerthan 5000 nm, the minimum distance DS3 between the projecting portionsPJ212 and the projecting portions PJ221 in the Y axis direction ispreferably, for example, 15000 nm to 50000 nm. With this, it is possibleto easily prevent or suppress the projecting portions PJ212 and theprojecting portions PJ221 from being short-circuited by the conductiveparticles contained in the anisotropic conductive film CF1 (see FIG. 12and FIG. 13).

Note that, for example, when the plurality of projecting portions PJ212are provided but the plurality of projecting portions PJ221 are notprovided, the minimum distance between two sensing electrodes TDL1 andTDL2 adjacent to each other is equal to a minimum distance between aside surface of the sensing electrode TDL2 on a sensing electrode TDL1side and the projecting portions PJ212 in the X axis direction. Also inthis case, preferably, a minimum distance between the side surface ofthe sensing electrode TDL2 on the sensing electrode TDL1 side and theprojecting portions PJ212 in the X axis direction is larger than theaverage particle diameter of the conductive particles contained in theanisotropic conductive film CF1 (see FIG. 12 and FIG. 13). Furthermore,more preferably, the minimum distance between the side surface of thesensing electrode TDL2 on the sensing electrode TDL1 side and theprojecting portions PJ212 in the X axis direction is three times aslarge as the average particle diameter of the conductive particlescontained in the anisotropic conductive film CF1 or larger (see FIG. 12and FIG. 13).

In this manner, the adjacent sensing electrodes TDL1 and TDL2 arepreferably disposed so as to have a similar minimum distance between anyportions thereof in not only the X axis direction and the Y axisdirection but also any direction.

In the first modification example, the end portion EG12 of theprojecting portion PJ212 on the sensing electrode TDL2 side is disposedin the X axis direction closer to the sensing electrode TDL2 side thanthe end portion EG21 of the projecting PJ221 on the sensing electrodeTDL1 side. Consequently, the effect of preventing or suppressing thecoating liquid for forming a protective film applied on the region AR2from spreading toward the region AR3 side is enhanced more than thefirst embodiment (see FIG. 16) in which the end portion EG12 of theprojecting portion PJ112 on the sensing electrode TDL2 side is disposedin the X axis direction closer to the sensing electrode TDL1 side thanthe end portion EG21 of the projecting portion PJ121 on the sensingelectrode TDL1 side.

Note that, also in the first modification example, as similar to thefirst embodiment described by using FIG. 12, the width WD2 of theportion PR2 in the X axis direction is larger than the width WD1 of theportion PR1 in the X axis direction. With this, the shoulder portion SH1can prevent or suppress the coating liquid for forming a protective filmapplied on the region AR1 from spreading toward the region AR2 (the samegoes for each of the following modification examples, althoughillustration of the widths WD1 and WD2 is omitted).

Second Modification Example of Concave/Convex Pattern

FIG. 20 is a plan view of a second modification example of theconcave/convex pattern in the electrode substrate of the firstembodiment.

As illustrated in FIG. 20, in the second modification example, theconcave/convex pattern UE1 includes a projecting portion PJ3 formed soas to project from a side surface of the portion PR2 of the sensingelectrode TDL extending in the Y axis direction formed in the regionAR2, when seen in a plan view. Therefore, the concave/convex pattern UE1is formed on the side surface of the portion PR2 and the protective film33 is terminated on the concave/convex pattern UE1 and on the portionPR2 as illustrated in FIG. 12, FIG. 13, and FIG. 15. In other words, theend portion EP1 of the protective film 33 on a region AR3 side ispositioned on the concave/convex pattern UE1 and on the portion PR2.Note that the projecting portion PJ3 is also a convex portion formed onthe first substrate 21.

In this manner, the projecting portion PJ3 serving as a step portion canincrease the length of the outer periphery of the portion PR2, and thearea of the side surface of the projecting portion PJ3 serving as a stepportion can increase the area of the side surface of the portion PR2.That is, the length of the step portion can be increased. Consequently,it is possible to prevent or suppress the coating liquid for forming aprotective film applied on the region AR2 from spreading toward theregion AR3 side, and the position of the end portion of the coatingliquid applied on the region AR2 can be highly accurately adjusted.

Preferably, the concave/convex pattern UE1 includes a plurality ofprojecting portions PJ3. The plurality of projecting portions PJ3 areformed so as to project from the side surface of the portion PR2 of thesensing electrode TDL extending in the Y axis direction formed in theregion AR2, and are arrayed in the Y axis direction, when seen in a planview. With this, it is possible to easily prevent or suppress thecoating liquid for forming a protective film applied on the region AR2from spreading toward the region AR3 side. Consequently, the position ofthe end portion of the coating liquid applied on the region AR2 can behighly accurately adjusted with ease.

In the second modification example, a concave/convex pattern UE11serving as the concave/convex pattern UE1 includes a plurality ofprojecting portions PJ31 serving as the projecting portion PJ3, and aconcave/convex pattern UE12 serving as the concave/convex pattern UE1includes a plurality of projecting portions PJ32 serving as theprojecting portion PJ3. The plurality of projecting portions PJ31 mayeach extend in the X axis direction as a whole, as being alternatelybent in opposite directions to each other, when seen in a plan view.Alternatively, the plurality of projecting portions PJ31 may each bebent once in the middle. Also, the plurality of projecting portions PJ32may extend in a direction intersecting both of the X axis direction andthe Y axis direction, when seen in a plan view.

Third Modification Example of Concave/Convex Pattern

FIG. 21 is a plan view of a third modification example of theconcave/convex pattern in the electrode substrate of the firstembodiment.

As illustrated in FIG. 21, in the third modification example, theconcave/convex pattern UE11 serving as the concave/convex pattern UE1includes a plurality of concave portions CC1. The plurality of concaveportions CC1 are formed on a side surface of the portion PR2 of thesensing electrode TDL extending in the Y axis direction formed in theregion AR2 when seen in a plan view. The plurality of concave portionsCC1 are arrayed in the Y axis direction.

Also, in the third modification example, the concave/convex pattern UE12serving as the concave/convex pattern UE1 includes a plurality of convexportions CV1. The plurality of convex portions CV1 are formed on a sidesurface of the portion PR2 of the sensing electrode TDL extending in theY axis direction formed in the region AR2, and are arrayed in the Y axisdirection when seen in a plan view.

In this manner, the concave portions CC1 as a step portion can increasethe length of the outer periphery of the portion PR2, and the area ofthe side surfaces of the concave portions CC1 as a step portion canincrease the area of the side surface of the portion PR2. That is, thelength of the step portion can be increased. Consequently, it ispossible to prevent or suppress the coating liquid for forming aprotective film applied on the region AR2 from spreading toward theregion AR3 side, and the position of the end portion of the coatingliquid applied on the region AR2 can be easily highly accuratelyadjusted.

Fourth Modification Example of Concave/Convex Pattern

FIG. 22 is a plan view of a fourth modification example of theconcave/convex pattern in the electrode substrate of the firstembodiment.

As illustrated in FIG. 22, in the fourth modification example, theconcave/convex pattern UE1 includes a notch portion NC1. The notchportion NC1 is formed by the cut from the side surface of the portionPR2 of the sensing electrode TDL extending in the Y axis directionformed in the region AR2 when seen in a plan view. Therefore, theconcave/convex pattern UE1 is formed on the side surface and the uppersurface of the portion PR2 and the protective film 33 is terminated onthe concave/convex pattern UE1 and on the portion PR2 as illustrated inFIG. 12, FIG. 13, and FIG. 15. In other words, the end portion EP1 ofthe protective film 33 on the region AR3 side is positioned on theconcave/convex pattern UE1 and on the portion PR2. Note that the notchportion NC1 is also a concave portion formed in the upper surface of thesensing electrode TDL. Also, the notch portion NC1 is a concave portionformed from the side surface of the sensing electrode TDL toward thecenter axis in the extending direction of the sensing electrode TDL.

In this manner, the notch portion NC1 serving as a step portion canincrease the length of the outer periphery of the portion PR2, and thearea of the side surface of the notch portion NC1 serving as a stepportion can increase the area of the side surface of the portion PR2.That is, the length of the step portion can be increased. Consequently,it is possible to prevent or suppress the coating liquid for forming aprotective film applied on the region AR2 from spreading toward theregion AR3 side, and the position of the end portion of the coatingliquid applied on the region AR2 can be highly accurately adjusted.

Preferably, the concave/convex pattern UE1 includes a plurality of notchportions NC1. The plurality of notch portions NC1 are formed by the cutfrom the side surface of the portion PR2 of the sensing electrode TDLextending in the Y axis direction formed in the region AR2, and arearrayed in the Y axis direction, when seen in a plan view. With this,the length of the outer periphery of the portion PR2 serving as a stepportion can be further increased. Consequently, it is possible to easilyprevent or suppress the coating liquid for forming a protective filmapplied on the region AR2 from spreading toward the region AR3 side, andthe position of the end portion of the coating liquid applied on theregion AR2 can be easily highly accurately adjusted.

Note that, in the fourth modification example, a concave/convex patternUE11 serving as the concave/convex pattern UE1 includes a plurality ofnotch portions NC11 serving as the notch portion NC1, and aconcave/convex pattern UE12 serving as the concave/convex pattern UE1includes a plurality of notch portions NC12 serving as the notch portionNC1. Each of the plurality of notch portions NC11 may extend in adirection intersecting both of the X axis direction and the Y axisdirection, when seen in a plan view. Also, each of the plurality ofnotch portions NC12 may each extend in the X axis direction as a wholeas being alternately bent in opposite directions to each other when seenin a plan view. Alternatively, each of the plurality of notch portionsNC12 may be bent once in the middle.

Fifth Modification Example and Sixth Modification Example ofConcave/Convex Pattern

FIG. 23 is a plan view illustrating a fifth modification example of theconcave/convex pattern in the electrode substrate of the firstembodiment. FIG. 24 is a plan view illustrating a sixth modificationexample of the concave/convex pattern in the electrode substrate of thefirst embodiment. Note that FIG. 23 illustrates the end portion of theprotective film 33 represented by a dashed-two dotted line.

As illustrated in FIG. 23 and FIG. 24, in the fifth modification exampleand the sixth modification example, the concave/convex pattern UE1includes a concave portion CC2. The concave portion CC2 is formed on theupper surface of the portion PR2 of the sensing electrode TDL extendingin the Y axis direction formed in the region AR2. Therefore, theconcave/convex pattern UE1 is formed on the upper surface of the portionPR2 and the protective film 33 is terminated on the concave/convexpattern UE1 as illustrated in FIG. 23. In other words, the end portionEP1 of the protective film 33 on the region AR3 side is positioned onthe concave/convex pattern UE1.

In this manner, the concave portion CC2 can increase the length of thestep portion included in the concave/convex pattern UE1. Consequently,it is possible to prevent or suppress the coating liquid for forming aprotective film applied on the region AR2 from spreading toward theregion AR3 side, and the position of the end portion of the coatingliquid applied on the region AR2 can be highly accurately adjusted.

Note that a concave portion reaching a middle point in the thicknessdirection of the portion PR2 may be formed as the concave portion CC2,and a concave portion penetrating through the portion PR2 to reach thesurface of the second substrate 31 may be formed.

Preferably, the concave/convex pattern UE1 includes a plurality ofconcave portions CC2. The plurality of concave portions CC2 are eachformed on the upper surface of the portion PR2 of the sensing electrodeTDL extending in the Y axis direction formed in the region AR2. Also,the plurality of concave portions CC2 are disposed in a staggeredconfiguration in the X axis direction. In other words, the plurality ofconcave portions CC2 form concave portion groups CCG2 arrayed in the Xaxis direction, and the plurality of these concave portion groups CCG2are arrayed in a direction intersecting both of the X axis direction andthe Y axis direction. That is, the plurality of concave portion groupsCCG2 are arrayed between two concave portion groups CCG2 adjacent toeach other in the Y axis direction so that the positions of the concaveportions CC2 in the X axis direction are different from each other.

With this, the coating liquid spreading toward a region AR3 side in theY axis direction through a portion of the upper surface of the portionPR2 between two concave portions CC2 adjacent to each other in the Xaxis direction included in the concave portion group CCG2 is stopped bya concave portion CC2 included in a concave portion group CCG2positioned closer to the region AR3 side than the concave portion groupCCG2 in the Y axis direction. Consequently, it is possible to easilyprevent or suppress the coating liquid for forming a protective filmapplied on the region AR2 from spreading toward the region AR3 side, andthe position of the end portion of the coating liquid applied on theregion AR2 can be easily highly accurately adjusted. Also, as comparedwith the case in which the plurality of concave portions CC2 eachcontinuously extend in the X axis direction, a current tends to flow inthe Y axis direction through the portion between two concave portionsCC2 adjacent to each other in the X axis direction.

Note that, as illustrated in FIG. 23, in the fifth modification example,the plurality of concave portions CC2 each have a rectangular shape whenseen in a plan view. On the other hand, as illustrated in FIG. 24, inthe sixth modification example, the plurality of concave portions CC2each have a circular shape when seen in a plan view. However, the lengthof the portion of the step portion included in the concave/convexpattern UE1 extending in the X axis direction is larger in the fifthmodification example illustrated in FIG. 23 than the sixth modificationexample illustrated in FIG. 24. The length of the portion of the stepportion included in the concave/convex pattern UE1 extending in the Xaxis direction is preferably large in view of preventing or suppressingthe coating liquid for forming a protective film applied on the regionAR2 from spreading toward the region AR3 side, that is, in the Y axisdirection. Therefore, the effect of preventing or suppressing thecoating liquid applied on the region AR2 from spreading toward theregion AR3 side is larger in the fifth modification example illustratedin FIG. 23 than the sixth modification example illustrated in FIG. 24.

Note that the shape of each of the plurality of concave portions CC2when seen in a plan view may be a circular shape and may be any ofvarious shapes such as an oval shape or a polygonal shape.

Also, as illustrated as the concave portion CC21 in a part of FIG. 23,the plurality of concave portions CC2 may only each continuously extendin the X axis direction and be arrayed in the Y axis direction when seenin a plan view. However, the effect of enhancing the performance of theelectrode substrate is larger in view of the fact that the current tendsto flow along the Y axis direction when the plurality of concaveportions CC2 are disposed in the X axis direction in a staggeredconfiguration.

Seventh Modification Example of Concave/Convex Pattern

FIG. 25 is a plan view illustrating a seventh modification example ofthe concave/convex pattern in the electrode substrate of the firstembodiment.

As illustrated in FIG. 25, in the seventh modification example, theconcave/convex pattern UE1 includes a concave portion CC3 and a concaveportion CC4. The concave portion CC3 and the concave portion CC4 areformed on the upper surface of the portion PR2 of the sensing electrodeTDL formed in the region AR2. Therefore, the concave/convex pattern UE1is formed on the upper surface of the portion PR2 and the protectivefilm 33 is terminated on the concave/convex pattern UE1 as illustratedin FIG. 23. In other words, the end portion EP1 of the protective film33 on a region AR3 side is positioned on the concave/convex pattern UE1.

Note that, as the concave portion CC3 and the concave portion CC4, aconcave portion reaching a middle point in the thickness direction ofthe portion PR2 may be formed, and a concave portion penetrating throughthe portion PR2 to reach the surface of the second substrate 31 may beformed.

The concave portion CC3 includes an extending portion CC31 and aplurality of extending portions CC32. The extending portion CC31 is aconcave portion formed on the upper surface of the portion PR2 on oneside (left side in FIG. 25) in the X axis direction and extending in theY axis direction. The plurality of extending portions CC32 are concaveportions each extending in the X axis direction and arrayed in the Yaxis direction. The plurality of extending portions CC32 are disposed onthe other side (right side in FIG. 25) of the extending portion CC31 inthe X axis direction, and an end portion of each of the plurality ofextending portions CC32 on one side (left side in FIG. 25) in the X axisdirection is connected to the extending portion CC31.

The concave portion CC4 includes an extending portion CC41 and aplurality of extending portions CC42. The extending portion CC41 is aconcave portion formed on the upper surface of the portion PR2 on theother side (right side in FIG. 25) in the X axis direction and extendingin the Y axis direction. The plurality of extending portions CC42 areconcave portions each extending in the X axis direction and arrayed inthe Y axis direction. The plurality of extending portions CC42 aredisposed on one side (left side in FIG. 25) of the extending portionCC41 in the X axis direction, and an end portion of each of theplurality of extending portions CC42 on the other side (right side inFIG. 25) in the X axis direction is connected to the extending portionCC41.

The extending portions CC32 and the extending portions CC42 arealternately disposed along the Y axis direction. Also, an end portionEG3 of each of the extending portions CC32 on the other side (right sidein FIG. 25) in the X axis direction is disposed closer to the other side(right side in FIG. 25) in the X axis direction than an end portion EG4of each of the extending portions CC42 on one side (left side in FIG.25) in the X axis direction.

The plurality of extending portions CC32 and the plurality of extendingportions CC42 can increase the length of the step portion included inthe concave/convex pattern UE1. Consequently, it is possible to preventor suppress the coating liquid applied on the region AR2 from spreadingtoward the region AR3 side.

On the other hand, the extending portions CC31 and CC41 can prevent orsuppress the coating liquid applied onto a portion of the secondsubstrate 31 positioned on the periphery of the sensing electrode TDL inthe region AR2 from overriding the portion PR2 of the sensing electrodeTDL.

As illustrated in FIG. 25, note that the extending portions CC31 andCC41 may be formed from the region AR2 over the region AR3. That is, theextending portions CC31 and CC41 may be formed from the upper surface ofthe portion PR2 of the sensing electrode TDL formed in the region AR2over the upper surface of the portion PR3 of the sensing electrode TDLformed in the region AR3.

Eighth Modification Example of Concave/Convex Pattern

FIG. 26 is a plan view illustrating an eighth modification example ofthe concave/convex pattern in the electrode substrate of the firstembodiment. Note that FIG. 26 illustrates the end portion of theprotective film 33 represented by a dashed-two dotted line.

In the example illustrated in FIG. 26, the concave/convex pattern UE1includes a convex portion CV2. The convex portion CV2 is a portion ofthe region AR2 positioned on the periphery of the sensing electrode TDLextending in the Y axis direction when seen in a plan view, and isformed on the second substrate 31 away from the sensing electrode TDL.In other words, the convex portion CV2 is a portion of the region AR2positioned between two sensing electrodes TDL adjacent to each other,and is formed on the second substrate 31 away from both of these twosensing electrodes TDL. Therefore, the concave/convex pattern UE1 isformed on the second substrate 31 in a portion of the region AR2positioned on the periphery of the sensing electrode TDL. As illustratedin FIG. 26, the protective film 33 is terminated on the concave/convexpattern UE1 and on the portion PR2 of the sensing electrode TDL formedin the region AR2. In other words, the end EP1 of the protective film 33on a region AR3 side is positioned on the concave/convex pattern UE1 andon the portion PR2.

In this manner, the convex portion CV2 can increase the length of thestep portion included in the concave/convex pattern UE1. Consequently,it is possible to prevent or suppress the coating liquid for forming aprotective film applied on the region AR2 from spreading toward theregion AR3 side, and the position of the end portion of the coatingliquid applied on the region AR2 can be highly accurately adjusted.

Preferably, the concave/convex pattern UE1 includes a plurality ofconvex portions CV2. Each of the plurality of convex portions CV2 is aportion of the region AR2 positioned on the periphery of the sensingelectrode TDL extending in the Y axis direction when seen in a planview, and is formed on the second substrate 31 away from the sensingelectrode TDL. Also, the plurality of concave portions CV2 are disposedin a staggered configuration in the X axis direction. In other words,the plurality of convex portions CV2 form convex portion groups CVG2arrayed in the X axis direction when seen in a plan view, and theplurality of convex portion groups CVG2 are arrayed in a directionintersecting both of the X axis direction and the Y axis direction. Thatis, the plurality of convex portion groups CVG2 are arrayed between twoconvex portion groups CVG2 adjacent to each other in the Y axisdirection so that the positions of the convex portions CV2 in the X axisdirection are different from each other.

With this, the coating liquid spreading toward a region AR3 side in theY axis direction through a portion of the upper surface of the secondsubstrate 31 included in the convex portion group CVG2 and between twoconvex portions CV2 adjacent to each other in the X axis direction isstopped by a convex portion CV2 included in the convex portion groupCVG2 positioned closer to the region AR3 side than the convex portiongroup CVG2 in the Y axis direction. Consequently, it is possible toeasily prevent or suppress the coating liquid for forming a protectivefilm applied on the region AR2 from spreading toward the region AR3side, and the position of the end portion of the coating liquid appliedon the region AR2 can be easily highly accurately adjusted. Also, twosensing electrodes TDL adjacent to each other are more difficult to beshort-circuited via the convex portion CV2 than those in the case inwhich the plurality of convex portions CV2 each continuously extend inthe X axis direction.

Preferably, in order to prevent two sensing electrodes TDL adjacent toeach other from being short-circuited, the convex portion CV2 is made ofsuch a low-conductive material that a current does not flow through theconvex portion CV2. Alternatively, in order to prevent two sensingelectrodes TDL adjacent to each other from being short-circuited,preferably, a minimum distance between the convex portions CV2 or aminimum distance between the sensing electrode TDL and the convexportion CV2 is three times as large as the average particle diameter ofthe conductive particles contained in the anisotropic conductive filmCF1 or larger (see FIG. 12 and FIG. 13).

As illustrated as a convex portion CV21 in a part of FIG. 26, note thatthe plurality of convex portions CV2 may only each continuously extendin the X axis direction and be arrayed in the Y axis direction when seenin a plan view. However, the effect of enhancing the performance of theelectrode substrate is large in view of the fact that two sensingelectrodes TDL adjacent to each other are difficult to beshort-circuited when the plurality of convex portions CV2 are disposedin the X axis direction in a staggered configuration.

Also, a plurality of types of various concave/convex patterns of thefirst embodiment and the first modification example to the eighthmodification example described above can be used in combination. Withthis, the effects caused by the various combined concave/convex patternsoverlap with each other, and therefore, it is possible to further easilyprevent or suppress the coating liquid for forming a protective filmapplied on the region AR2 from spreading toward the region AR3 side.

Ninth Modification Example of Concave/Convex Pattern

FIG. 27 is a plan view illustrating a ninth modification example of theconcave/convex pattern in the electrode substrate of the firstembodiment.

As illustrated in FIG. 27, also in the ninth modification example, theconcave/convex pattern UE1 includes a plurality of convex portions CV3as similar to the eighth modification example illustrated in FIG. 26.The plurality of convex portions CV3 are portions of the region AR2positioned on the periphery of the sensing electrode TDL extending inthe Y axis direction when seen in a plan view, and are formed on thesecond substrate 31 away from the sensing electrode TDL.

On the other hand, in the ninth modification example illustrated in FIG.27, the plurality of convex portions CV3 each extend in the Y axisdirection and are arrayed in the X axis direction when seen in a planview as different from the eighth modification example illustrated inFIG. 26.

The coating liquid for forming a protective film includes the one havingextremely low fluidity. In such a case, there is a risk that the coatingliquid applied onto the second substrate 31 so as to cover the sensingelectrode TDL in the regions AR1 and AR2 does not spread to a desiredposition in the Y axis direction so that the end portion of theprotective film 33 is positioned closer to the region AR1 side than thedesired position in the Y axis direction in the region AR2.Consequently, in the region AR2, there is a risk that a portion of thesensing electrode TDL more than necessary is exposed from the protectivefilm 33.

On the other hand, in the ninth modification example illustrated in FIG.27, the concave/convex pattern UE1 formed of a plurality of convexportions CV3 each extending in the Y axis direction and arrayed in the Xaxis direction is formed in the region AR2 between two sensingelectrodes TDL adjacent to each other in the X axis direction. Withthis, the fluidity of the coating liquid in the Y axis direction can beincreased more than that in the case without the formation of theconcave/convex pattern UE1. Consequently, the coating liquid appliedonto the second substrate 31 so as to cover the sensing electrode TDL inthe regions AR1 and AR2 is easy to spread to the desired position in theY axis direction, and therefore, the position of the end portion of thecoating liquid applied on the region AR2 can be highly accuratelyadjusted.

Preferably, in order to prevent the two adjacent sensing electrodes TDLfrom being short-circuited, the convex portion CV3 is formed of such alow-conductive material that a current does not flow through the convexportion CV3. Alternatively, in order to prevent the two adjacent sensingelectrodes TDL from being short-circuited, preferably, a minimumdistance between the convex portions CV3 or a minimum distance betweenthe sensing electrode TDL and the convex portion CV3 is three times aslarge as the average particle diameter of the conductive particlescontained in the anisotropic conductive film CF1 (see FIG. 12 and FIG.13) or larger.

As illustrated as the convex portions CV31 in a part of FIG. 27, notethat the plurality of convex portions CV3 may not be continuously formedin the Y axis direction when seen in a plan view, and may be dividedinto, for example, two along the Y axis direction.

Also, in FIG. 16, FIG. 19, FIG. 20, FIG. 22, FIG. 23, and FIG. 25 toFIG. 27, the case of the concave/convex pattern UE1 having therectangular shape when seen in a plan view has been exemplarilydescribed. However, in the first embodiment and each modificationexample of the first embodiment described by using FIG. 16, FIG. 19,FIG. 20, FIG. 22, FIG. 23, and FIG. 25 to FIG. 27, the concave/convexpattern UE1 may have some or all of sides curved.

<Method for Manufacturing Electrode Substrate>

Next, a method for manufacturing an electrode substrate is describedwith reference to FIG. 28 to FIG. 32.

FIG. 28, FIG. 29, FIG. 31, and FIG. 32 are cross-sectional views in amanufacturing process of the electrode substrate according to the firstembodiment. FIG. 30 is a perspective view in the manufacturing processof the electrode substrate according to the first embodiment. In FIG. 31and FIG. 32, the periphery of a step portion included in theconcave/convex pattern is illustrated so as to be enlarged.

First, as illustrated in FIG. 28A, the second substrate 31 is prepared.The second substrate 31 has regions AR1, AR2, and AR3 serving as regionson an upper surface as a main surface of the second substrate 31. Theregions AR1, AR2, and AR3 are sequentially disposed in the Y axisdirection when seen in a plan view.

Note that various substrates such as a transparent glass substrate or afilm made of, for example, resin can be used as the second substrate 31as described above.

Next, as illustrated in FIGS. 28B and 29G, the sensing electrode TDL isformed. In this step of forming the sensing electrode TDL, first, aconductive film CF2 is deposited on the second substrate 31 asillustrated in FIG. 28B. In this step of depositing the conductive filmCF2, for example, a conductive film formed of a metal film can bedeposited by sputtering or chemical vapor deposition (CVD). Preferably,as the conductive film CF2, a conductive film including a metal layer oran alloy layer made of one or more metals selected from a groupincluding aluminum (Al), copper (Cu), silver (Ag), molybdenum (Mo),chrome (Cr), and tungsten (W) can be deposited, the conductive filmbeing formed of a single- or multi-layered film.

Note that, after performing the step of forming a conductive film andbefore performing a patterning step described later, in order to makewettability of the coating liquid to be applied by the ink jet method orthe electric field jet method uniform, a surface processing can beperformed to the substrate on which the conductive film has been formed.As such a surface processing, a surface processing by UV light, asurface processing by atmospheric pressure (AP) plasma, or a surfaceprocessing by hexamethyldisiloxane (HMDS) can be performed.

Next, the conductive film CF2 is patterned. In the step of patterningthis conductive film CF2, the conductive film CF2 can be patterned byusing, for example, photolithography and etching techniques. Note thatthe following is the explanation for the exemplary case of the formationof the concave/convex pattern UE1 including the concave portions CC2 ofthe sixth modification example of the first embodiment illustrated inFIG. 24, the case being in the formation of the concave/convex patternUE1 including the concave portions CC2 by using the same step as thestep of forming the sensing electrode TDL. Also, the following is theexplanation for the exemplary case in which the concave portions CC2penetrate through the conductive film CF2 to reach the surface of thesecond substrate 31.

Specifically, firstly, as illustrated in FIG. 28C, a resist film RF1 isapplied onto the conductive film CF2. Next, as illustrated in FIG. 28D,the resist film RF1 is patterned and exposed by exposure light EL1 byusing a photomask having a light-shielding pattern SP1 formed in aregion where, for example, the sensing electrode TDL is to be formedother than the region where the concave portions CC2 are to be formed.Note that FIG. 28D illustrates only the light-shielding pattern SP1 ofthe photomask.

Next, as illustrated in FIG. 29E, the patterned and exposed resist filmRF1 is developed so as to form a resist pattern RP1 formed of the resistfilm RF1 left in the region where the sensing electrode TDL is to beformed other than the region where the concave portions CC2 are to beformed. Next, as illustrated in FIG. 29F, the conductive film CF2 isetched by using the resist pattern RP1 as an etching mask. Then, asillustrated in FIG. 29G, for example, ashing is performed, so that theresist pattern RP1 is removed. With this, the sensing electrode TDLformed of the conductive film CF2 and the concave portions CC2 providedin the upper surface of the sensing electrode TDL are formed.

The sensing electrode TDL is continuously formed on the second substrate31 from the region AR1 of the upper surface of the second substrate 31via the region AR2 of the upper surface of the second substrate 31 overthe region AR3 of the upper surface of the second substrate 31.Preferably, the sensing electrode TDL extends in the Y axis directionwhen seen in a plan view.

A portion of the sensing electrode TDL formed in the region AR1 isregarded as a portion PR1. The portion PR1 is the main body portion MP1of the sensing electrode TDL (see FIG. 12). Also, a portion of thesensing electrode TDL formed in the region AR2 is regarded as a portionPR2. On the upper surface of the portion PR2 of the sensing electrodeTDL formed in the region AR2, the concave portions CC2 are formed.Furthermore, a portion of the sensing electrode TDL formed in the regionAR3 is regarded as a portion PR3. The portion PR3 is the electrodeterminal ET1 electrically connected to the wiring substrate (see FIG.12). Note that the portion PR2 is also included in a part of theelectrode terminal ET1 in the example illustrated in FIG. 29G.

Also, in the example illustrated in FIG. 28B to FIG. 29G, theconcave/convex pattern UE1 including the concave portions CC2illustrated in FIG. 24 is formed by the same step as the step of formingthe sensing electrode TDL. Alternatively, in place of the concave/convexpattern illustrated in FIG. 24, the concave/convex pattern UE1illustrated in any of FIG. 16, FIG. 19 to FIG. 23, and FIG. 25 to FIG.27 can be formed. In this step of forming the concave/convex patternUE1, the concave/convex pattern UE1 is formed on the surface of theportion PR2 of the sensing electrode TDL formed in the region AR2, orthe concave/convex pattern UE1 is formed on the second substrate 31 in aportion of the region AR2 positioned on the periphery of the sensingelectrode TDL. In other words, the concave/convex pattern UE1 is formedon the sensing electrode TDL or the second substrate 31 in the regionAR2.

Here, as the concave/convex pattern UE1, a concave/convex pattern UE1formed of a conductive film formed on the same layer as the conductivefilm CV2 included in the sensing electrode TDL is formed. Also, byforming the concave/convex pattern UE1 in the same step as the step offorming the sensing electrode TDL, the number of manufacturing processescan be reduced. Note that the concave/convex pattern UE1 illustrated inany of FIG. 16 and FIG. 19 to FIG. 27 can also be formed by patterningthe conductive film CF2 by performing not the same step as the step offorming the sensing electrode TDL but a step similar to the step offorming the sensing electrode TDL.

Furthermore, as the example illustrated in FIG. 28B to FIG. 29G, theformation of the concave/convex pattern UE1 formed of the conductivefilm on the same layer as the conductive film included in the sensingelectrode TDL as the concave/convex pattern UE1 is exemplified. However,a concave/convex pattern UE1 formed of a film of a type different fromthat of the conductive film included in the sensing electrode TDL can beformed.

Next, as illustrated in FIG. 29H, the protective film 33 is formed. Inthis step of forming the protective film 33, coating liquid for forminga protective film is first applied. In this step of applying the coatingliquid, the coating liquid is applied by a coating method. Preferably,the coating liquid is applied by a printing method of partially applyingthe coating liquid containing a solvent. In other words, the protectivefilm 33 is formed by a printing mode of partially applying a solution.That is, as a method of forming the protective film 33, any of printingmethods of partially forming a film with a solvent can be applied ingeneral. As such a printing method, various printing methods such as anink jet method, an electric field jet method, screen printing,flexographic printing, offset printing, or gravure printing can be used.Also, the following is the explanation for the exemplary case of theapplication of the coating liquid for forming a protective film by theink jet method or the electric field jet method.

As the protective film 33, for example, a resin film formed of a UVsetting resin or a thermosetting resin made of acryl resin, epoxy resin,polyimide resin, or others can be formed. Therefore, as the coatingliquid for forming a protective film, coating liquid containing theabove-described UV setting resin or thermosetting resin can be used.

When the coating liquid is applied by the ink jet method or the electricfield jet method, as illustrated in FIG. 30, the coating liquid 52 isdischarged from a nozzle provided to a nozzle head 51 as the nozzle head51 provided so as to be relatively removable with respect to the secondsubstrate 31 is relatively moved with respect to the second substrate31. With this, the coating liquid 52 is applied in the regions AR1 andAR2 so as to cover the sensing electrode TDL.

Also, as illustrated in FIG. 30, the coating liquid 52 is dischargedsimultaneously from the plurality of nozzles by using the nozzle head 51having a plurality of nozzles arrayed in a certain direction, so thattime required for the step of applying the coating liquid 52 can bereduced.

That is, after the coating liquid 52 is applied onto the secondsubstrate 31 by use of the ink jet method or the electric field jetmethod so as to cover the sensing electrode TDL to form the coating film53, the formed coating film 53 is cured, so that a protective film witha desired pattern can be formed without increasing the number ofmanufacturing processes.

In addition, when the coating liquid is applied by using a printingmethod such as the ink jet method or the electric field jet method, itis not necessary to prepare a photomask for forming the pattern formedof the coating film that is formed by applying the coating liquid byusing photolithography and etching, and thus a desired pattern can beformed each time. Further, when the coating liquid is applied by usingthe printing method such as the ink jet method or the electric field jetmethod, the coating liquid can be efficiently used, and thus themanufacturing cost can be reduced. Moreover, when the printing methodsuch as the ink jet method or the electric field jet method is used, thefilm can be deposited under the atmospheric pressure and it is notnecessary to use the deposition apparatus provided with a vacuumchamber, and thus the deposition apparatus can be downsized.

In the first embodiment, the concave/convex pattern UE1 is formed on thesurface of the portion PR2 of the sensing electrode TDL formed in theregion AR2 or the concave/convex pattern UE1 is formed on the secondsubstrate 31 in a portion of the region AR2 positioned on the peripheryof the sensing electrode TDL. In other words, the concave/convex patternUE1 is formed on the sensing electrode TDL or the second substrate 31 inthe region AR2. With this, the length of the step portion formed in theregion AR2 can be increased. Consequently, it is possible to prevent orsuppress the coating liquid for forming a protective film applied on theregion AR2 from spreading toward the region AR3 side, and the positionof the end portion of the coating liquid applied on the region AR2 canbe easily highly accurately adjusted.

The case in which a step portion ST1 included in the concave/convexpattern UE1 and formed of a high-level portion HP1 and a low-levelportion LP1 formed of, for example, a projecting portion PJ1 extends ina direction DR2 intersecting a direction DR1 in which the coating liquid52 spreads as illustrated in FIG. 31 is assumed. In such a case, acoating liquid 52 spreading in the direction DR1 on the high-levelportion HP1 stops at, for example, the peripheral edge of the high-levelportion HP1, that is, on the upper surface of the step portion ST1 anddoes not spread up to the low-level portion LP1. Thus, it is possible toprevent or suppress the coating liquid 52 from spreading further in thedirection DR1 beyond the step portion ST1.

More specifically, in the step of applying the coating liquid 52, thecoating liquid 52 is applied so that the applied coating liquid 52 isterminated on the concave/convex pattern UE1. In other words, in thestep of applying the coating liquid 52, the coating liquid 52 on theregion AR3 side is applied so that an end portion of the applied coatingliquid 52 is positioned on the concave/convex pattern UE1.

Here, the case of the cross-sectional shape of the projecting portionPJ1 as a convex portion included in the concave/convex pattern UE1 asdescribed by using FIG. 17 and FIG. 18 is considered. That is, the casewith such a cross-sectional shape having the upper end portion HE1 ofthe side surface portion SS1 positioned closer to one side than thelower end portion LE1 of the side surface portion SS1 in the Y axisdirection and having the upper end portion HE2 of the side surfaceportion SS2 positioned closer to the other side than the lower endportion LE2 of the side surface portion SS2 in the Y axis direction isconsidered. FIG. 32 illustrates a case having, for example, an invertedtrapezoidal cross-sectional shape perpendicular to the direction DR2 inwhich the projecting portion PJ1 extends. Such a case enhances an effectof stopping the coating liquid 52 spreading on the high level portionHP1 in the direction DR1 at an upper side of the step portion ST1.Consequently, the position of the end portion of the coating liquid 52can be further highly accurately adjusted.

When the projecting portion PJ1 with such a cross-sectional shape isformed, note that the conductive film CF2 having the lower layer portionLL1 (see FIG. 17) and the upper layer portion HL1 (see FIG. 17) isformed in the step of forming the conductive film CF2 described by usingFIG. 28B. Here, as described by using FIG. 17, the lower layer portionLL1 and the upper layer portion HL1 are laminated so that, for example,the etching speed of the lower layer portion LL1 with respect to anetchant is higher than the etching speed of the upper layer portion HL1with respect to that etchant. Then, in the step of etching theconductive film CF2 described by using FIG. 29F, etching is performed byusing that etchant. With this, the projecting portion PJ1 can be formedso that the upper end portion HE1 of the side surface portion SS1 ispositioned closer to one side (left side in FIG. 17) than the lower endportion LE1 of the side surface portion SS1 in the Y axis direction andthe upper end portion HE2 of the side surface portion SS2 is positionedcloser to the other side (right side in FIG. 17) than the lower endportion LE2 of the side surface portion SS2 in the Y axis direction.

Next, the protective film 33 is formed by curing the coating film 53formed of the applied coating liquid 52. When the coating liquidcontaining the UV setting resin is used as the coating liquid 52, theformed coating film 53 is irradiated with light formed of UV, that is,UV light, so that the coating film 53 is cured. Alternatively, when thecoating liquid containing the thermosetting resin is used as the coatingliquid 52, the formed coating film 53 is thermally treated, so that thecoating film 53 is cured. With this, as illustrated in FIG. 29H, theprotective film 33 formed of the cured coating film 53 is formed.

Here, as described above, when the applied coating liquid 52 isterminated on the concave/convex pattern UE1, that is, the formedcoating film 53 is terminated on the concave/convex pattern UE1, theprotective film 33 formed of the cured coating film 53 is alsoterminated on the concave/convex pattern UE1. In other words, when anend portion of the coating film 53 on the region AR3 side is positionedon the concave/convex pattern UE1, the end portion EP1 of the protectivefilm 33 on the region AR3 side is also positioned on the concave/convexpattern UE1.

Next, the wiring substrate WS1 (see FIG. 13) is electrically connected.In this step of electrically connecting the wiring substrate WS1, thewiring substrate WS1 is disposed on the second substrate 31 via theanisotropic conductive film (ACF) CF1 (see FIG. 13). On the lowersurface of the wiring substrate WS1 as a main surface thereof, aplurality of electrode terminals ET2 (see FIG. 13) are formed. Theplurality of electrode terminals ET2 (see FIG. 13) are disposed so as tocorrespond to the electrode terminals ET1 of the plurality of sensingelectrodes TDL, respectively. As described above, a flexible printedwiring board also referred to as flexible printed circuit (FPC) can beused as the wiring substrate WS1.

The anisotropic conductive film CF1 is disposed in the regions AR2 andAR3 so as to cover the sensing electrode TDL. Also, the wiring substrateWS1 is disposed on the second substrate 31 via the anisotropicconductive film CF1 so that the plurality of electrode terminals ET2 areopposed to the electrode terminals ET1 via the anisotropic conductivefilm CF1, respectively.

The anisotropic conductive film CF1 is a film formed by shaping amixture of a thermosetting resin with conductive fine metal particlesinto a film. In a state in which the anisotropic conductive film CF1 isinterposed between the electrode terminals ET1 of the sensing electrodeTDL and the electrode terminals ET2 of the wiring substrate WS1, thewiring substrate WS1 is pressed onto the second substrate 31 by, forexample, a heat treatment. With this, the metal particles in theanisotropic conductive film CF1 contact each other in a thicknessdirection of the anisotropic conductive film CF1 to form a conductivepath in the thickness direction of the anisotropic conductive film CF1.The electrode terminals ET1 and the electrode terminals ET2 opposed toeach other are electrically connected to each other via the anisotropicconductive film CF1.

<Regarding Position Adjustment of End Portion of Protective Film>

Next, position adjustment of the end portion of the protective film isdescribed while comparing with position adjustment of the end portion ofthe protective film in a comparative example.

FIG. 33 is a plan view illustrating an electrode substrate according tothe comparative example. FIG. 34 is a perspective view illustrating theelectrode substrate of the comparative example. FIG. 35 is across-sectional view schematically illustrating the shape of the coatingliquid on a glass substrate. FIG. 36 is a cross-sectional viewschematically illustrating the shape of the coating liquid on theperiphery of a sensing electrode formed on the glass substrate.

In the comparative example, an electrode substrate ES100 serving as anopposing substrate 103 includes the second substrate 31, the sensingelectrode TDL, and the protective film 33. Also, the second substrate 31has regions AR1, AR2, and AR3 serving as regions on an upper surface asa main surface of the second substrate 31. The areas AR1, AR2, and AR3are sequentially disposed in the Y axis direction when seen in a planview.

Also in the comparative example, the sensing electrode TDL issequentially formed on the second substrate 31 from the region AR1 ofthe upper surface of the second substrate 31 via the region AR2 of theupper surface of the second substrate 31 over the region AR3 of theupper surface of the second substrate 31. Alternatively, the sensingelectrode TDL extends in the Y axis direction when seen in a plan view.

Also in the comparative example, a portion of the sensing electrode TDLformed in the region AR1 is regarded as a portion PR1. The portion PR1is a main body MP1 of the sensing electrode TDL. Also, a portion of thesensing electrode TDL formed in the region AR2 is regarded as a portionPR2. Furthermore, a portion of the sensing electrode TDL formed in theregion AR3 is regarded as a portion PR3. The portion PR3 and the portionPR2 are the electrode terminal ET1 electrically connected to theelectrode terminal ET2 formed on the wiring substrate WS1.

The protective film 33 is formed so as to cover the sensing electrodeTDL in the regions AR1 and AR2. Also in the comparative example, theprotective film 33 is formed on the second substrate 31 by applying thecoating liquid by the ink jet method or the electric field jet method.

On the other hand, in the comparative example, the concave/convexpattern is not formed on the surface of the portion PR2 of the sensingelectrode TDL formed in the region AR2. Also, the concave/convex patternis not formed on the second substrate 31 in a portion of the region AR2positioned on the periphery of the sensing electrode TDL, either.

However, when the coating liquid is applied onto the second substrate 31by the ink jet method or the electric field jet method, it is difficultto highly accurately adjust the position of the end portion of thecoating liquid spreading on the second substrate 31.

For example, in the case in which the coating liquid is applied by theink jet method or the electric field jet method onto a surface of thesecond substrate 31 and the surface of the second substrate 31 islyophilic to the coating liquid to some extent, the coating liquidapplied to the surface of the second substrate 31 easily spreads andthus it is difficult to highly accurately adjust the position of the endportion of the coating liquid. The spreadability of the coating liquidapplied on the second substrate 31 is varied depending on the surfacetension acting on the coating liquid.

For example, the interfacial tension exists as the force acting on aninterface between the liquid phase and the gas phase or between theliquid phase and the solid phase. For example, the reason why a dropletdropped onto a surface of a flat substrate remains in a hemisphere stateis that water molecules in the droplet are pulled inside by the van derWaals' force to each other and interfacial tension acts so as to reducethe surface area of the droplet. In addition, when the interfacialtension acting so as to reduce the surface area as an interface isacting on a liquid, this interfacial tension is referred to also assurface tension of the liquid.

The larger the van der Waals's force of liquid is, the larger suchsurface tension of liquid is. Thus, the more the atomic weight ormolecular weight of the materials contained in the liquid, the largerthe surface tension is. Therefore, surface tension of the coating liquidapplied on the second substrate 31 is varied depending on the type ofthe coating liquid.

On the other hand, the spreadability of the coating liquid applied onthe second substrate 31 is varied depending on the shape of the surfaceof the second substrate 31 other than the type of the coating liquid.

For example, surface tension is uniformly applied from the periphery ofthe coating liquid 52 to the coating liquid 52 applied onto a portion ofthe second substrate 31 away from the sensing electrode TDL asillustrated in the cross-sectional view of FIG. 35. Therefore, thecoating liquid 52 is relatively difficult to spread. On the other hand,surface tension is applied only from one side of the coating liquid 52to the coating liquid 52 applied onto a portion of the second substrate31 positioned on the periphery of the sensing electrode TDL and incontact with the side surface of the sensing electrode TDL, asillustrated in the cross-sectional view of FIG. 36. Therefore, thecoating liquid 52 is easy to spread along the side surface of thesensing electrode TDL.

In this manner, when the coating liquid 52 is easy to spread along theside surface of the sensing electrode TDL, the coating liquid 52 is easyto spread also on a portion of the upper surface of the sensingelectrode TDL closer to the side surface.

Consequently, the protective film 33 formed by curing the coating filmformed of the applied coating liquid 52 is not terminated on the portionPR2, and is formed from the portion PR1 via the portion PR2 over theportion PR3.

That is, in the comparative example, the position of the end portion ofthe coating liquid 52 applied on the region AR2 cannot be highlyaccurately adjusted. Consequently, it is difficult to highly accuratelyadjust the position of the end portion EP1 of the protective film 33formed by curing the coating film formed of the applied coating liquid52. Therefore, there is a risk that the end portion EP1 of the formedprotective film 33 exceeds a desired position or does not reach thedesired position. That is, there is a risk that an area of a portion ofthe electrode terminal ET1 of the sensing electrode TDL exposed from theprotective film 33 varies among the plurality of sensing electrodes TDL.

Also in the comparative example, as similar to the first embodiment, theportion PR3 of the sensing electrode TDL formed in the region AR3 iselectrically connected to the electrode terminal ET2 formed on thewiring substrate WS1 via the anisotropic conductive film CF1. That is, aportion of the electrode terminal ET1 of the sensing electrode TDLexposed from the protective film 33 is electrically connected to thewiring substrate WS1.

Therefore, as described above, when the area of the portion of theelectrode terminal ET1 of the sensing electrode TDL exposed from theprotective film 33 varies among the plurality of sensing electrodes TDL,connection resistance between the sensing electrode TDL and the wiringsubstrate WS1 varies among the plurality of sensing electrodes TDL, andtherefore, there is a risk of decrease in the performance as theelectrode substrate.

For example, when the end portion EP1 of the protective film 33 exceedsthe desired position, the protective film 33 is formed on the portionPR3 of the sensing electrode TDL formed in the region AR3, and the areaof the portion of the electrode terminal ET1 of the sensing electrodeTDL exposed from the protective film 33 is decreased. In this case,connection resistance between the sensing electrode TDL and the wiringsubstrate WS1 is increased, and therefore, there is a risk of decreasein the performance as the electrode substrate.

On the other hand, when the coating liquid is difficult to flowdepending on the type of the coating liquid, there is a risk that theend portion EP1 of the protective film 33 does not reach the desiredposition of the portion PR2 of the sensing electrode TDL formed in theregion AR2. In this case, the portion PR2 of the sensing electrode TDLformed in the region AR2 is partially exposed from both of the wiringsubstrate WS1 and the protective film 33, and therefore, for example,moisture in the air enters the exposed portion of the sensing electrodeTDL, and therefore, there is a risk of corrosion of the sensingelectrode TDL.

In the techniques described in the Patent Documents 1 to 3, a lyophilicregion and a repellant region need to be formed on a surface of asubstrate in order to adjust spreading of the applied coating liquid, sothat the number of steps of the manufacturing process may be increaseddue to the addition of steps of forming the lyophilic region and therepellant region. In addition, since it is not easy to form thelyophilic region and the repellant region on the surface of theelectrode formed on the substrate, the spreading of the coating liquidapplied to the surface of the electrode formed on the substrate cannotbe highly accurately adjusted.

In the technique described in the Patent Document 4, since a film to bequickly dried is applied like a frame as a stopper and a film which isdried slowly but good at leveling effect is then applied, the number ofsteps of the manufacturing process may be increased. In addition, sincethe material of the coating liquid is limited in order to obtain adesired drying rate, it cannot be widely used in practical manufacturingprocesses.

Note that it is difficult to adjust the position of an end portion ofthe applied coating liquid also in various electrode substrates on whicha protective film is formed so as to partially cover the electrodesformed on a substrate by applying the coating liquid by the ink jetmethod or the electric field jet method with the inclusion of the firstsubstrate 21 in which the common electrode COML.

Main Features and Effects of Present Embodiment

On the other hand, in the first embodiment, the electrode substrate ESincludes the concave/convex pattern UE1. The concave/convex pattern UE1is formed on the surface of the portion PR2 of the sensing electrode TDLformed in the region AR2, or is formed on the second substrate 31 in theportion of the region AR2 positioned on the periphery of the sensingelectrode TDL. That is, the concave/convex pattern UE1 is formed on thesensing electrode TDL or the second substrate 31 in the region AR2.Also, the end portion EP1 of the protective film 33 on the region AR3side formed so as to cover the sensing electrode TDL is positioned onthe concave/convex pattern UE1.

With this, when the protective film 33 is formed so as to cover thesensing electrode TDL, the position of the end portion EP1 of theprotective film 33 can be highly accurately adjusted. Therefore, it ispossible to prevent or suppress the variation of the area of the portionof the electrode terminal ET1 of the sensing electrode TDL exposed fromthe protective film 33 among the plurality of sensing electrodes TDL.Consequently, it is possible to prevent or suppress the variation of theconnection resistance between the sensing electrode TDL and the wiringsubstrate WS1 among the plurality of sensing electrodes TDL, so that theperformance as the electrode substrate can be improved. In addition, theperformance of the display device including such an electrode substratecan be improved.

For example, it is possible to prevent or suppress the protective film33 from being formed on the portion PR3 of the sensing electrode TDLformed in the region AR3, and it is possible to prevent or suppress thearea of the portion of the electrode terminal ET1 of sensing electrodeTDL exposed from the protective film 33 from being decreased.Consequently, it is possible to prevent or suppress connectionresistance between the sensing electrode TDL and the electrode terminalET2 from being increased, so that the performance as the electrodesubstrate can be improved.

On the other hand, even if the coating liquid is difficult to flow, bythe formation of the concave/convex pattern UE1, the protective film 33can be formed so that the position of the end portion EP1 of theprotective film 33 reaches the desired position of the portion PR2 ofthe sensing electrode TDL formed in the region AR2. Therefore, it ispossible to prevent or suppress the portion PR2 of the sensing electrodeTDL formed in the region AR2 from being partially exposed from both ofthe wiring substrate WS1 and the protective film 33, so that it ispossible to prevent or suppress the sensing electrode TDL from corrodingdue to the entrance of, for example, the moisture in the air into thesensing electrode TDL of the exposed portion.

Also, in the first embodiment, it is not necessary to form a lyophilicregion and a repellant region on the surface of the second substrate 31in order to adjust spreading of the applied coating liquid. Thus, it isnot necessary to perform a step of forming a lyophilic region and arepellant region and the number of steps of the manufacturing processcan be reduced.

Further, in the first embodiment, since it is not necessary to apply afilm to be quickly dried like a frame as a stopper and then apply a filmwhich is slowly dried but good at leveling, the number of steps of themanufacturing process can be reduced. Also, the material of the coatingliquid for obtaining a desired drying rate is not limited, and it can bewidely used in practical manufacturing processes.

Note that, in the first embodiment, an electrode substrate used as theopposing substrate 3 in which the sensing electrode TDL is formed in adisplay device with an input device has been exemplified as theelectrode substrate ES. However, the electrode substrate ES according tothe first embodiment can be applied to various electrode substrates onwhich a protective film is formed so as to partially cover theelectrodes formed on the substrate by applying the coating liquid by theprinting method such as the ink jet method or the electric field jetmethod with the inclusion of the first substrate 21 in which the commonelectrode COML (same goes for the following respective embodiments).

Second Embodiment

In the first embodiment, an example in which a display device providedwith a touch panel as an input device is applied to an in-cell liquidcrystal display device with a touch sensing function in which a commonelectrode COML of the display device serves also as a driving electrodeof the input device has been described. Meanwhile, in the secondembodiment, an example in which a display device provided with a touchpanel as an input device is applied to an in-cell liquid crystal displaydevice with a touch sensing function in which a common electrode COML ofthe display device and a driving electrode of the input device areseparately formed will be described.

Note that the display device of the second embodiment can be applied toan in-cell display device in which an input device is integrallyprovided for various display devices such as an organic EL displaydevice as well as a liquid crystal display device.

<Display Device with Touch-sensing Function>

FIG. 37 is a cross-sectional view illustrating a display device with atouch sensing function in the display device of the second embodiment.

In the display device according to the second embodiment, respectivecomponents other than the cross-sectional structure of the opposingsubstrate 3, for example, the shape and arrangement of theconcave/convex pattern UE1 (see FIG. 12) in a plan view are similar tothe respective components of the display device of the first embodimentother than the cross-sectional structure of the opposing substrate 3.Therefore, the descriptions thereof will be omitted. Accordingly, partswhich differ from those described in the first embodiment with referenceto FIG. 9 and FIG. 10 will be mainly described with reference to FIG.37.

The display device 10 with a touch sensing function includes the pixelsubstrate 2, the opposing substrate 3 and the liquid crystal layer 6.The opposing substrate 3 is disposed so that an upper surface serving asa main surface of the pixel substrate 2 and a lower surface serving as amain surface of the opposing substrate 3 are opposed to each other. Theliquid crystal layer 6 is provided between the pixel substrate 2 and theopposing substrate 3.

In the second embodiment, the pixel substrate 2 includes commonelectrodes COML1. The common electrodes COML1 operate as drivingelectrodes of the liquid crystal display device 20 (see FIG. 1), but donot operate as driving electrodes of the touch sensing device 30 (seeFIG. 1). Accordingly, unlike the first embodiment, a plurality of commonelectrodes need not to be provided as the common electrodes COML1, andit is also possible to provide one common electrode obtained by, forexample, coupling and integrating the common electrodes COML of thefirst embodiment.

Since parts of the pixel substrate 2 and the liquid crystal layer 6 ofthe display device of the second embodiment other than the commonelectrodes COML1 are similar to respective parts of the pixel substrate2 and the liquid crystal layer 6 of the display device of the firstembodiment, the descriptions thereof will be omitted. Also, the circuitdiagram corresponding to the plurality of pixels of the display deviceof the second embodiment is similar to the circuit diagram correspondingto the plurality of pixels of the display device of the first embodimentillustrated in FIG. 10 except for the point that the common electrodesCOML1 are provided instead of the common electrodes COML. Therefore, thedescriptions of the parts of the display device of the second embodimentwhich are similar to the parts described with reference to FIG. 10 inthe first embodiment will be omitted.

In the second embodiment, the opposing substrate 3 includes a secondsubstrate 31, a color filter 32, a driving electrode DRVL, an insulatingfilm 35, a sensing electrode TDL, and a protective film 33. The secondsubstrate 31 has an upper surface serving as a main surface and a lowersurface serving as a main surface opposed to the upper surface. Thecolor filter 32 is formed on the lower surface of the second substrate31 serving as one main surface. The driving electrode DRVL is a drivingelectrode of a touch sensing device 30 and is formed on the uppersurface of the second substrate 31 serving as the other main surface.The insulating film 35 is formed on the upper surface of the secondsubstrate 31 so as to cover the driving electrode DRVL. The sensingelectrode TDL is the sensing electrode of the touch sensing device 30,and is formed on the insulating film 35. More specifically, the sensingelectrode TDL is formed on the upper surface of the second substrate 31serving as the other main surface via the driving electrode DRVL and theinsulating film 35. The protective film 33 is formed on the insulatingfilm 35 so as to cover the sensing electrodes TDL.

The sensing electrode TDL and the concave/convex pattern UE1 (see FIG.12) in the second embodiment can be the same as those described in thefirst embodiment except for the point that the sensing electrode TDL andthe concave/convex pattern UE1 are formed on the insulating film 35. Inaddition, the protective film 33 in the second embodiment can be thesame as that in the first embodiment except for the point that theprotective film 33 is formed on the insulating film 35.

In the second embodiment, the common electrodes COML1 operate as drivingelectrodes of the liquid crystal display device 20, but do not operateas driving electrodes of the touch sensing device 30. The drivingelectrodes DRVL operate as driving electrodes of the touch sensingdevice 30, but do not operate as driving electrodes of the liquidcrystal display device 20. Therefore, it is possible to independentlyperform the display operations by the common electrodes COML1 and thetouch sensing operations by the driving electrodes DRVL in parallel toeach other.

Note that the concave/convex pattern may be formed on the surface of aportion of the electrode terminal of the driving electrode DRVL on amain body portion side of the driving electrode DRVL. Alternatively, theconcave/convex pattern may be formed on the second substrate 31 in aportion of the electrode terminal of the driving electrode DRVLpositioned on the periphery of the portion on the main body portion sideof the driving electrode DRVL. Here, the end portion of the insulatingfilm 35 serving as a protective film is positioned on the concave/convexpattern. In this manner, by the provision of the concave/convex pattern,the position of the end portion of the insulating film 35 can be highlyaccurately adjusted when the insulating film 35 is formed.

<Main Features and Effects of Present Embodiment>

Also in the second embodiment, as similar to the first embodiment, theelectrode substrate ES has the concave/convex pattern UE1. Theconcave/convex pattern UE1 is formed on the surface of the portion PR2of the sensing electrode TDL formed in the region AR2 or is formed onthe second substrate 31 in a portion of the region AR2 positioned on theperiphery of the sensing electrode TDL. That is, the concave/convexpattern UE1 is formed on the sensing electrode TDL or the secondsubstrate 31 in the region AR2. Also, in the regions AR1 and AR2 the endportion EP1 of the protective film 33 on the region AR3 side formed soas to cover the sensing electrode TDL is positioned on theconcave/convex pattern UE1.

With this, such effects that, as similar to those of the firstembodiment, the position of the end portion EP1 of the protective film33 can be highly accurately adjusted when the protective film 33 isformed so as to cover the sensing electrode TDL, and the variation ofthe connection resistance between the sensing electrode TDL and theelectrode terminal ET2 among the plurality of sensing electrodes TDL canbe prevented or suppressed can be obtained. Also, as similar to thefirst embodiment, the performance of a display device including such anelectrode substrate can be improved.

Further, in the second embodiment, the common electrode COML1 of thedisplay device and the driving electrode DRVL of the input device areseparately formed. Consequently, since it is not necessary to separatethe display period in which display operations are performed by thecommon electrodes COML1 and the touch sensing period in which touchsensing operations are performed by the driving electrodes DRVL, thedetection performance of touch sensing can be improved, for example, thesensing speed of touch sensing can be apparently improved.

In the first and second embodiments, an example in which a displaydevice provided with a touch panel as an input device is applied to anin-cell liquid crystal display device with a touch sensing function hasbeen described. However, the display device provided with a touch panelas an input device may be applied to an on-cell liquid crystal displaydevice with a touch sensing function. The on-cell liquid crystal displaydevice with a touch sensing function indicates a liquid crystal displaydevice with a touch sensing function in which neither the drivingelectrodes nor the sensing electrodes included in the touch panel areincorporated in the liquid crystal display device.

<Input Device>

FIG. 38 is a cross-sectional view illustrating an input device as afirst modification example of the second embodiment. In the exampleillustrated in FIG. 38, the input device has a structure substantiallysimilar to that of the second substrate 31 and a portion positionedupper than the second substrate 31 in the display device with a touchsensing function illustrated in FIG. 37.

As illustrated in FIG. 38, the input device as the first modificationexample of the second embodiment includes a second substrate 31, adriving electrode DRVL, an insulating film 35, a sensing electrode TDL,and a protective film 33. Also in FIG. 38, in place of the polarizingplate 34 illustrated in FIG. 37, a third substrate 34 a formed of acover glass is provided. Furthermore, although omitted in FIG. 38, thesensing electrode TDL is connected to, for example, the touch sensingunit 40 illustrated in FIG. 1. Therefore, the input device as the firstmodification example of the second embodiment includes the secondsubstrate 31, the driving electrode DRVL, the sensing electrode TDL, andthe sensing circuit as, for example, a touch sensing unit 40 illustratedin FIG. 1, the protective film 33, and the third substrate 34 a.

Also in this input device, when the protective film 33 is formed so asto cover the sensing electrode TDL, the position of the end portion EP1of the protective film 33 can be highly accurately adjusted, andtherefore, effects similar to the effects included in the display deviceof the second embodiment can be provided.

<Self-Capacitance-Type Touch Sensing Function>

In the first embodiment, the second embodiment, and the firstmodification example of the second embodiment, the explanation has beenmade for the example in which a mutual-capacitance-type touch panelprovided with a common electrode operating as a driving electrode and asensing electrode is applied as the touch panel. However, aself-capacitance-type touch panel provided with only a sensing electrodecan be applied as the touch panel.

FIG. 39 and FIG. 40 are explanatory diagrams illustrating an electricalconnection state of a self-capacitance-type sensing electrode.

In a self-capacitance-type touch panel, as illustrated in FIG. 39, whenthe sensing electrode TDL with a capacitance Cx is disconnected from asensing circuit SC1 with a capacitance Cr1 and is electrically connectedto a power supply Vdd, a charge quantity Q1 is accumulated in thesensing electrode TDL with the capacitance Cx. Next, as illustrated inFIG. 40, when the sensing electrode TDL with the capacitance Cx isdisconnected from the power supply Vdd and is electrically connected tothe sensing circuit SC1 with the capacitance Cr1, a charge quantity Q2flowing to the sensing circuit SC1 is sensed.

Here, when a finger makes contact with or approach the sensing electrodeTDL, a capacitance by the finger changes the capacitance Cx of thesensing electrode TDL. When the sensing electrode TDL is connected tothe sensing circuit SC1, the charge quantity Q2 flowing out to thesensing circuit SC1 is also changed. Therefore, by measuring theflowing-out charge quantity Q2 by the sensing circuit SC1 to sense achange of the capacitance Cx of the sensing electrode TDL, it can bedetermined whether a finger makes contact with or approach the sensingelectrode TDL.

When the input device described by using FIG. 38 is an input deviceprovided with a self-capacitance-type touch sensing function, thesensing electrode TDL is provided in place of the driving electrodeDRVL. When this input device provided with a self-capacitance-type touchsensing function is taken as the input device of the second modificationexample of the second embodiment, the input device of the secondmodification example of the second embodiment includes the secondsubstrate 31, the sensing electrode TDL, a sensing circuit such as thetouch sensing unit 40 illustrated in FIG. 1, the protective film 33, andthe third substrate 34 a. Also, the input device of the secondmodification example of the second embodiment may include a plurality ofsensing electrodes TDL each extending in the X axis direction (see FIG.7) and arrayed so as to be spaced apart from each other in the Y axisdirection (see FIG. 7) and a plurality of sensing electrodes TDL eachextending in the Y axis direction and arrayed so as to be spaced apartfrom each other in the X axis direction. In this case, by sensing achange of the capacitance Cx of each of the plurality of sensingelectrodes TDL extending in each direction, the input position can betwo-dimensionally sensed.

Also in this input device, when the protective film 33 is formed so asto cover the sensing electrode TDL, the position of the end portion EP1of the protective film 33 can be highly accurately adjusted, andtherefore, effects similar to effects included in the display device ofthe second embodiment can be provided.

Third Embodiment

Next, electronic devices as application examples of the display devicesdescribed in the first embodiment and the second embodiment will bedescribed with reference to FIG. 41 to FIG. 47. The display devices ofeach of the first embodiment and the second embodiment are applicable toelectronic devices of all kinds of fields such as in-car apparatus suchas HUD (Head Up Display) and a navigation system, television apparatus,digital cameras, notebook PCs, portable terminal devices such as mobilephones and video cameras. In other words, the display devices of thefirst embodiment and the second embodiment can be applied to electronicdevices of all kinds of fields which display video signals input fromoutside or generated inside as images or video pictures.

<Television Apparatus>

FIG. 41 is a perspective view illustrating an external appearance of atelevision apparatus as one example of an electronic device of the thirdembodiment. This television apparatus includes, for example, a videodisplay screen unit 513 including a front panel 511 and a filter glass512, and the video display screen unit 513 is made up of the in-celldisplay device with a touch sensing function or the on-cell displaydevice with a touch sensing function described in the first embodimentand the second embodiment.

<Digital Camera>

FIG. 42 is a perspective view illustrating an external appearance of adigital camera as one example of an electronic device of the thirdembodiment. The digital camera includes, for example, a display unit522, a menu switch 523 and a shutter button 524, and the display unit522 is made up of the in-cell display device with a touch sensingfunction or the on-cell display device with a touch sensing functiondescribed in the first embodiment and the second embodiment.

<Notebook PC>

FIG. 43 is a perspective view illustrating an external appearance of anotebook PC as one example of an electronic device of the thirdembodiment. The notebook PC includes, for example, a main body 531, akeyboard 532 for input operations of characters or the like, and adisplay unit 533 for displaying images, and the display unit 533 is madeup of the in-cell display device with a touch sensing function or theon-cell display device with a touch sensing function described in thefirst embodiment and the second embodiment.

<Video Camera>

FIG. 44 is a perspective view illustrating an external appearance of avideo camera as one example of an electronic device of the thirdembodiment. The video camera includes, for example, a main body portion541, a lens 542 for shooting objects provided on a front surface of themain body portion 541, a start/stop switch 543 for shooting and adisplay unit 544, and the display unit 544 is made up of the in-celldisplay device with a touch sensing function or the on-cell displaydevice with a touch sensing function described in the first embodimentand the second embodiment.

<Mobile Phone>

FIG. 45 and FIG. 46 are front views illustrating an external appearanceof a mobile phone as one example of an electronic device of the thirdembodiment. FIG. 46 illustrates a state in which the mobile phoneillustrated in FIG. 45 is folded. The mobile phone is composed of, forexample, an upper housing 551 and a lower housing 552 coupled by acoupling portion (hinge portion) 553 and includes a display 554, asub-display 555, a picture light 556 and a camera 557, and the display554 or the sub-display 555 is made up of the display device with a touchsensing function described in the first embodiment and the secondembodiment.

<Smartphone>

FIG. 47 is a front view illustrating an external appearance of asmartphone as one example of an electronic device of the thirdembodiment. The mobile phone includes, for example, a housing 561 and atouch screen 562. The touch screen 562 is composed of, for example, atouch panel serving as an input device and a liquid crystal panelserving as a display unit, and is made up of the in-cell display devicewith a touch sensing function or the on-cell display device with a touchsensing function described in the first embodiment and the secondembodiment.

The touch panel of the touch screen 562 is, for example, the touchsensing device 30 provided in the display device 10 with a touch sensingfunction of the display device 1 described with reference to FIG. 1.When a user makes gesture operations such as a touch operation or a dragoperation on the touch panel with a finger or a touch pen, the touchpanel of the touch screen 562 senses coordinates of the positionscorresponding to the gesture operations and outputs them to a controlunit (not shown).

The liquid crystal panel of the touch screen 562 is, for example, theliquid crystal display device 20 provided in the display device 10 witha touch sensing function of the display device 1 described withreference to FIG. 1. Further, the liquid crystal panel of the touchscreen 562 made up of the display device 1 includes, for example, thedriving electrode driver 14 of the display device 1 described withreference to FIG. 1. The driving electrode driver 14 applies voltage asimage signals to the pixel electrodes 22 (see FIG. 9) provided in eachof the plurality of sub-pixels SPix (see FIG. 10) arrayed in a matrixform at respectively constant timings, thereby displaying images.

<Main Features and Effects of Present Embodiment>

In the third embodiment, the display devices of each of the firstembodiment and the second embodiment can be used as the display devicesprovided in the above-described various electronic devices.Consequently, in the display devices provided in the above-describedvarious electronic devices, the same effects as those of the firstembodiment and the second embodiment can be obtained. Namely, whenforming the protective film 33 so as to cover the sensing electrode TDL,the position of the end portion EP1 of the protective film 33 can behighly accurately adjusted. Accordingly, it is possible to improve theperformance of the above-described various electronic devices, or thenumber of steps of the manufacturing process of the above-describedvarious electronic devices can be reduced.

In the foregoing, the invention made by the inventors of the presentinvention has been concretely described based on the embodiments.However, it is needless to say that the present invention is not limitedto the foregoing embodiments and various modifications and alterationscan be made within the scope of the present invention.

Further, in the foregoing embodiments, the cases of a liquid crystaldisplay device have been illustrated as disclosure examples, but allkinds of flat-panel display devices such as an organic EL displaydevice, other self-luminous type display devices and electronic paperdisplay devices having electrophoresis elements may be listed as otherapplication examples. Further, it goes without saying that the presentinvention is applicable to small, medium and large sized devices withoutany particular limitation.

In the category of the idea of the present invention, a person withordinary skill in the art can conceive various modified examples andrevised examples, and such modified examples and revised examples arealso deemed to belong to the scope of the present invention.

For example, the examples obtained by appropriately making theadditions, deletions or design changes of components or the additions,deletions or condition changes of processes to respective embodimentsdescribed above by a person with ordinary skill in the art also belongto the scope of the present invention as long as they include the gistof the present invention.

The present invention is effectively applied to an electrode substrate,a display device, an input device, and a method of manufacturing anelectrode substrate.

It should be understood that various changes and modifications to thepresently preferred embodiments described herein will be apparent tothose skilled in the art. Such changes and modifications can be madewithout departing from the spirit and scope of the present subjectmatter and without diminishing its intended advantages. It is thereforeintended that such changes and modifications be covered by the appendedclaims.

The invention is claimed as follows:
 1. A detection device comprising: afirst substrate including a first region, a second region and a thirdregion, the second region arranged between the first region and thethird region; a detection electrode arranged on the first substrate; afirst electrode coupled to the detection electrode, continuously formedfrom the first region to the third region in a first direction on thefirst substrate, and including a plurality of concave portions in thesecond region; and a protective layer formed on the first electrode inthe first region, wherein the protective layer is formed on a first oneof the concave portions in the second region, wherein the protectivefilm is not formed on a second one of the concave portions in the secondregion, the second one of the concave portions is arranged nearer to thethird region than the first one of the concave portions.
 2. Thedetection device according to claim 1, wherein at least one of theconcave portions has a quadrangle shape.
 3. The detection deviceaccording to claim 1, wherein at least one of the concave portions has around shape.
 4. The detection device according to claim 1, wherein theconcave portions include a first concave portion and a second concaveportion adjacent to the first concave portion in a second directioncrossing to the first direction.
 5. The detection device according toclaim 4, wherein the concave portions include a third concave portion,wherein the third concave portion is adjacent to the first concaveportion in the first direction, and wherein the third concave portion isarranged between the first concave portion and the second concaveportion in the second direction.
 6. The detection device according toclaim 1, wherein the concave portions include a first concave portion, asecond concave portion and a third concave portion, wherein the secondconcave portion is arranged between the first concave portion and thethird concave portion in the first direction, and wherein, in a seconddirection crossing to the first direction, a center position of thefirst concave portion is different from a center position of the secondconcave portion.
 7. The detection device according to claim 1, whereinthe concave portions include a first concave portion and a secondconcave portion, and wherein, in a second direction crossing to thefirst direction, a width of the first concave portion is different froma width of the second concave portion.
 8. The detection device accordingto claim 1, wherein the concave portions including a first concaveportion extending to the first direction and a second concave portionextending to a second direction crossing to the first direction.
 9. Adetection device comprising: a first substrate including a first region,a second region and a third region, the second region arranged betweenthe first region and the third region; a detection electrode arranged onthe first substrate; a first electrode coupled to the detectionelectrode, continuously formed from the first region to the third regionin the first direction on the first substrate, and including a pluralityof concave portions, a plurality of first portions, and a plurality ofsecond portions in the second region, the first portions extending inthe first direction and arranged apart from each other in a seconddirection crossing to the first direction, the second portions extendingin the second direction and arranged apart from each other in the firstdirection, the first and second portions being located outside theconcave portions; and a protective layer formed on the first electrodein the first region, wherein the protective layer is formed on a firstone of a plurality of projecting portions, the projecting portionsincluding both the first portions and the second portions, wherein theprotective layer is not formed on a second one of the projectingportions, the second one is arranged nearer to the third region than thefirst one is.
 10. The detection device according to claim 9, wherein thefirst electrode includes a plurality of frame portions formed by twoadjacent first portions of a group of the first portions, and twoadjacent second portions of a group of the second portions.
 11. Thedetection device according to claim 10, wherein the frame portionsinclude a first frame portion and a frame portion adjacent to the firstframe portion in the second direction.
 12. The detection deviceaccording to claim 11, wherein the frame portions include a third frameportion, wherein the third frame portion is adjacent to the first frameportion in the first direction, and wherein the third frame portion isarranged between the first frame portion and the second frame portion inthe second direction.
 13. The detection device according to claim 10,wherein the frame portions include a first frame portion, a second frameportion and a third frame portion, wherein the second frame portion isarranged between the first frame portion and the third frame portion inthe first direction, and wherein, a center position of the first frameportion is different from a center position of the frame concave portionin the second direction.
 14. The detection device according to claim 10,wherein the frame portions include a first frame portion and a secondframe portion, and wherein a width of the first frame portion isdifferent from a width of the second frame portion in the seconddirection.
 15. A detection device comprising: a first substrateincluding a first region, a second region and a third region, the secondregion arranged between the first region and the third region; adetection electrode arranged on the first substrate; a first electrodecoupled to the detection electrode and continuously formed from thefirst region to the third region in the first direction on the firstsubstrate; and a protective layer formed on the first electrode in thefirst region, wherein the first electrode includes a first regionportion arranged in the first region, a second region portion arrangedin the second region, and a third region portion arranged in the thirdregion, wherein the second region portion includes a plurality ofconcave portions, a plurality of first portions, and a plurality ofsecond portions, the first portions extending in the first direction andarranged apart from each other in a second direction crossing to thefirst direction, the second portions extending in the second directionand arranged apart from each other in the first direction, the first andsecond portions being located outside the concave portions, wherein awidth of the first region portion is smaller than a width of the thirdregion portion in the second direction, and wherein a width of each ofthe first portions is smaller than a width of the first region portion.16. The detection device according to claim 15, wherein the firstelectrode includes a plurality of frame portions formed by two adjacentfirst portions of a group of the first portions, and two adjacent secondportions of a group of the second portions.
 17. The detection deviceaccording to claim 16, wherein the frame portions include a first frameportion and a frame portion adjacent to the first frame portion in thesecond direction.
 18. The detection device according to claim 17,wherein the frame portions include a third frame portion, wherein thethird frame portion is adjacent to the first frame portion in the firstdirection, and wherein the third frame portion is arranged between thefirst frame portion and the second frame portion in the seconddirection.
 19. The detection device according to claim 16, wherein theframe portions include a first frame portion, a second frame portion anda third frame portion, wherein the second frame portion is arrangedbetween the first frame portion and the third frame portion in the firstdirection, and wherein, a center position of the first frame portion isdifferent from an center position of the frame concave portion in thesecond direction.
 20. The detection device according to claim 16,wherein the frame portions include a first frame portion and a secondframe portion, and wherein a width of the first frame portion isdifferent from a width of the second frame portion in the seconddirection.